Nippon Sheet Glass Company, Limited

Toshiaki Anzaki

Etsuo Ogino

Kenji Mori

Yoshifumi Kijima

Takayuki Toyoshima

Hiroaki Yamamoto

Hiroyuki Tanaka

Koichiro Nakamura

Kenjiro Hamanaka

Takashi Fukuzawa

Masahiro Hori

Maki Nakamura

Toshiaki Mizuno

Hirokazu Tanaka

Kazuhiro Doushita

Terufusa Kunisada

Teruyuki Sasaki

Masaatsu Kido

Kenichi Yamada

Takashi Ikuno

Hideaki Saitoh

A photocatalyst layer (TiO) is formed on the surface of a substrate (glass plate) through the intermediary of a monoclinic undercoat layer (ZrO), and no dead layer is substantially present between the photocatalyst layer and the undercoat layer. Also, by providing a peel preventing layer between the substrate and the undercoat layer, it is possible to eliminate film peeling between the photocatalyst layer and the substrate, defects and discoloration. A metal element may be doped in the photocatalyst layer, and it is preferable that the metal element is at least one of Sn, Zn, Mo and Fe. The phrase 'no dead layer is substantially present' means that the thickness of the dead layer is 20 nm or less. The thickness of the photocatalyst layer is preferably from 1 nm to 1,000 nm, more preferably from 1 nm to 500 nm.

Member having photocatalytic function and method for manufacture thereof

There is provided a method for evaluating the contamination by quantifying the surface contamination of an object such as a window glass plate, a wall, or the like in such a manner that the quantified value is close to the visual sensation of human being. The method comprises the steps of taking a color image of the surface of the object, converting a color image data denoting the color image into a monochromatic image data, dividing a monochromatic image denoted by the monochromatic image data into a dot matrix to obtain lightness per dot, selecting an area to be evaluated on the dot matrix, calculating a standard deviation of lightness from the distribution of lightness of the selected area.

Method for evaluating contamination on surface of object and imaging box used for the method

The optical device having a predetermined surface profile of the invention is fabricated by forming a multi-layered dielectric film on the surface of a solid composition layer having a glass transition temperature of not lower than 100&#xb0; C. The solid composition layer is formed by molding and curing a polymerizable organic group-having fluid composition. The curing may be effected through photopolymerization or thermal polymerization of the polymerizable organic group in the composition, and a predetermined surface profile is transferred onto the composition layer from the mold used. The cured composition is released from the mold, and this is coated with a multi-layered dielectric film.

Optical device and method for fabricating the same

An optical fiber collimator which facilitates optical adjustment. The optical fiber collimator includes a gradient index rod lens, and an optical fiber optically connected to the rod lens. An anti-reflection film is formed on one end face of the rod lens. The anti-reflection film has a refractive index which continuously changes from a value substantially equal to that of a center refractive index of the rod lens to a value substantially equal to that of the refractive index of the optical fiber along a film thickness direction of the anti-reflection film. A refractive index matching medium having a refractive index substantially equal to that of the optical fiber bonds the anti-reflection film to the end face of the optical fiber.

Optical fiber collimator and optical fiber collimator array

The sheet resistance of titanium oxide film can be controlled in 10 to 10 &OHgr;/&square; by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under and oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.

Substrate with photocatalytic film and method for producing the same

This invention relates to an article having a substrate with a photocatalyst coating film formed thereon by ae sputtering method, characterized in that the photocatalyst coating film comprises titanium oxide as a main component and at least one kind of metal having a sputtering rate for Ar being 0.9 to 2.7 times that of Ti, preferably at least one kind of metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr, in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed by a method using a Ti metal sputtering target or a Ti sub-oxide sputtering target containing the metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two kinds of targets for two sputtering cathodes and applying reversing potential so as to have a cathode and an anode alternately.

Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film

A method of film deposition is disclosed, which eliminates the conventional problem that a coating film having a component concentration gradient in the thickness direction and thus having a boundary with a compositional gradient or a coating film in which two or more components coexist as a mixture thereof cannot be stably obtained by sputtering. In the method, two planar cathodes are closely arranged as a pair, and a voltage is applied thereto while alternately inverting the polarities thereof so that when a target A bonded to one of the cathodes is used as a negative electrode, then a target B bonded to the other cathode and differing to the target A in component is used as a positive electrode. The targets A and B are simultaneously bombarded with positive ions while passing a substrate in front of the targets so as to cross the cathodes. Thus, a coating film having a boundary with a compositional gradient in the thickness direction or a coating film having a two-layer structure composed of a layer of ingredient A and a layer of ingredient B is deposited by sputtering through one-direction conveyance.

Method of film deposition on substrate surface and substrate produced by the method

A light transmitting electromagnetic wave filter comprising a transparent and a light transmitting electromagnetic wave shield film having a laminate structure composed of 2n&plus;1 (n&gE;1) layers in which at least two dielectric layers and at least one silver layer are alternately laminated, with each other with the dielectric layer being the first to be provided on the transparent substrate, wherein at least one of the dielectric layers is an antistatic metal oxide layer having a refractive index of 1.6 to 2.7 at a wavelength of 550 nm, which is preferably formed by sputtering using a metal oxide, e.g., tin-containing indium oxide, as a target in an atmosphere having a reduced oxygen content. The electromagnetic wave filter has a high visible light transmission and a low near infrared transmission, is free from pin holes or contamination, and exhibits high durability against moist heat, etc.

Light transmitting electromagnetic wave filter and process for producing the same

A transparent touch panel substrate comprising a transparent substrate and deposited thereon a transparent conductive metal oxide film which contains zinc, indium, and tin as metallic elements and is soluble in acids. The transparent conductive metal oxide film preferably contains zinc in an amount of from 40 to 65 atomic % based on all metals and contains indium in an amount of from 0.25 to 1.3 times the amount of tin on an atomic basis. The film preferably has a thickness of from 100 to 160 nm. Unlike the conventional substrate for resistive film type transparent touch panels which comprises a glass plate coated with a transparent conductive ITO film, the touch panel substrate of the invention combines three properties: high light transmittance; ease of processing in forming a transparent electrode by acid etching; and the transparent conductive film has a moderate sheet resistance of from 500 to 5,000&OHgr;. It therefore realizes a touch panel which combines the three functions of having satisfactory display quality, being of the power-saving type, and enabling touch switch operations to be conducted without fail.

Touch panel substrate having transparent conductive film

There may be used a film-forming apparatus having a substrate that is rotatable around the center of one rotating axis in the vertical direction situated in an inner cylinder and a plurality (four in FIG. ) of target units each comprising the pair of targets A, B ( B is under A serially arranged in the vertical direction inside an outer cylinder opposite the surface of the substrate which are arranged in parallel in the circumferential direction of the inner wall of the outer cylinder By employing a method whereby voltage is applied while alternatively reversing the polarity to each of the targets A, B, it is possible to form a coating on the surface of a substrate by glow discharge sputtering, to accomplish destaticizing while the sputtering can be carried out using a small in-line or bell jar apparatus with small space.

Film-forming apparatus and film-forming method

A method of manufacturing a substrate for displays is provided, which can easily control the surface electrical resistance of the anti-electrification film formed on a surface of the substrate, and a substrate for displays manufactured by the same method. The film is formed by preparing a target from a metal oxide, and forming a thin film of a metal oxynitride on a surface of the substrate by sputtering using the target in an atmosphere of a mixture gas of an inert gas and nitrogen, a mixing ratio of the inert gas and nitrogen in the atmosphere being adjusted such that the thin film has a desired surface electrical resistance.

Method of manufacturing a substrate for displays and a substrate for displays manufactured by same

Sputtering method and apparatus for forming a coating on both sides of a flat substrate or on the entire surface of a bulky substrate without involving rotation of the substrate. At least one pair of sputtering cathodes each having a target attached thereto are arranged in a film-forming chamber capable of controlling a vacuum atmosphere with their target sides facing each other, and a substrate is disposed in front of the targets. A voltage is applied to the sputtering cathodes in such a manner that the polarity alternates between the sputtering cathodes making the pair to induce a glow discharge between the sputtering cathodes. The target on each sputtering cathode is thereby sputtered and deposited on the substrate.

Method for forming coating on substrate and sputtering apparatus used for the method

An electromagnetic wave filter for a plasma display panel which is effective in preventing incorrect actions of a remote control of appliances, comprising a transparent substrate, a light transmitting electromagnetic wave shield film, and a resin protective film, wherein the electromagnetic wave shield film is a 7-layered laminate in which a dielectric layer and a metal layer containing silver as the principal ingredient are laminated alternately with the dielectric layer being the first to be provided on the transparent substrate, the dielectric layer has a refractive index of 1.6 to 2.8 at 550 nm, and the metal layer containing silver as the principal ingredient contains 0.1 atomic % or more and less than 0.5 atomic % of palladium based on silver and has a thickness of 5 to 25 nm, whereby the electromagnetic wave shield film has a sheet resistance of 3 &OHgr;/&square; or lower and a near infrared transmission of 20% or lower at 850 nm.

Electromagnetic wave filter for plasma display panel

A process for inexpensively producing an insulating substrate suitable for use in image displays fabricated through a high-temperature production step, such as plasma displays and field emission displays (FED). A multilayered insulating film of one member selected from SiO,, a silicon oxynitride, and a silicon nitride is coated on a surface of a glass plate by reactive sputtering using one or more silicon targets in oxygen or/and nitrogen. The interface between layers in the multilayered insulating film functions to trap sodium ions thermally diffusing from the glass, whereby the amount of sodium ions which dissolve in the insulating film and reach the surface thereof is considerably reduced.

Method for coating insulating film and glass substrate for image display using the same

A transparent electrically conductive film-attached substrate comprising a transparent glass substrate having formed on the surface thereof a transparent electrically conductive film, wherein the transparent electrically conductive film is formed by successively laminating a reflection preventing layer, a silver layer or a metal layer comprising silver as the main component, and a reflection preventing layer, and the reflection preventing layer comprises a composite oxide of zinc and indium. Atomic ratio of zinc and indium of the reflection preventing layer represented by Ad zinc/(zinc+indium) is from 0.03 to 0.9. The substrate has both the moisture and heat resistance and the alkali resistance and is suitable for a display element such as a liquid crystal cell.

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Osaka, Japan

Toshiaki Anzaki