Hitachi Metals, Ltd.

Toru Sugihara

Noriyoshi Hirao

Yoshitaka Chiba

Kazumi Noguchi

Hiroya Suzuki

Kiyomi Tanaka

Osamu Okuno

Kenji Hasegawa

Permanent magnet assembly, keeper and magnetic attachment for denture

A high melting metal silicide sputtering target which comprises a fine texture whose stoichiometric composition grains of MSi.sub.2, where M represents a high melting metal, have a maximum grain size of 20 .mu.m, whose free silicon grains have a maximum grain size of 50 .mu.m and whose oxygen content is not more than 200 ppm and has a density ratio to the theoretical density of 99% or more has good film characteristics including the reduction in the number of grains formed on the sputtered film and is useful as an electrode material or a wiring material in semi-conductor devices.

Sputtering target and process for preparing the same

Growing community of inventors

Kumagaya, Japan

Toru Sugihara