Toyo Gosei Co., Ltd.

Other

Toyo Gosei Kogyo Co., Ltd.

Toyo Gosai Kogyo Co., Ltd.

Toyo Gosei Kogyo, Ltd.

Toru Shibuya

Noriaki Tochizawa

Takeshi Ikeya

Kazunori Kataoka

Hideo Kikuchi

Mitsuharu Miyazaki

Mineko Takeda

Akihiro Hirano

Kentaro Tada

Masanori Kurihara

Jian Rong Xie

Kana Miyazaki

Kazuo Yamada

A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; Ris a linear or branched alkyl group having 1-6 carbon atoms or an alkylene group having 2-6 carbon atoms formed from two Rtogether; Ris &#x2014;NRR; Rand Rare each independently a linear or branched alkyl group or alkenyl group having 1-6 carbon atoms, a linear or branched alkylene group having 2-6 carbon atoms formed by Rand Rtogether, or a linear or branched alkylene group or alkenylene group having 3-8 carbon atoms optionally containing an oxygen atom or nitrogen atom.)

Photosensitive compound, photosensitive resin, and photosensitive composition

The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition. The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).

Photosensitive resin, photosensitive composition and photo-crosslinked structure

A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.

Polymer composite

The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin. The photosensitive compound containing a photosensitive unit represented by formula (1):wherein R is selected from among the following groups,

Photosensitive compound and photosensitive resin

The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.

Photosensitive compounds, photosensitive resin compositions, and pattern

A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.

Photosensitive resin composition

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Chiba, Japan

Toru Shibuya