Fujitsu Corporation

Fujitsu Vlsi Limited

Toru Oshima

Hiroshi Yasuda

Akio Yamada

Yoshihisa Oae

Junichi Kai

Takamasa Satoh

Keiji Yamada

A workpiece to be processed is placed and fixed to an X-Y stage capable of translation motion along X-and Y-axis directions orthogonal to each other. The X-Y stage is moved to a first position. The X-Y stage is approach-run in the X-axis direction and in a negative Y-axis direction and stopped at a second position. The workpiece is processed while the X-Y stage stops at the second position. The process of moving the X-Y stage in the negative Y-axis direction by some distance and processing the workpiece while the X-Y stage stops, is repetitively executed. Even if the regularity of motion of the X-Y stage is disturbed, it is possible to suppress a lowered stage position accuracy.

Method and apparatus for processing workpiece by using X-Y stage capable of improving position accuracy

An electron-beam exposure system includes an astigmatic compensation circuit that increases a voltage applied across a pair of electrodes forming an electrostatic sub-deflector and simultaneously decreases a voltage applied across another pair of electrodes forming the same electrostatic sub-deflector with a same magnitude as in the case of increasing the voltage, wherein the magnitude of the voltage change is changed in response to the deflection of the electron-beam caused by a main deflector.

Electron-beam exposure system for reduced distortion of electron beam

Growing community of inventors

Kawasaki, Japan

Toru Oshima