Nippon Telegraph and Telephone Corporation

Hitachi, Ltd.

Nippon Telephone and Telegraph Corporation

Hitachi Service Engineering Co., Ltd.

Hitachi Service Engineering, Ltd.

Toru Murashita

Manabu Matsumoto

Takashi Ikeguchi

Tadasi Sonobe

Shinjiroo Ueda

Satoshi Ido

Akinori Shibayama

Kazuo Kuroishi

Toshiaki Kobari

Shunji Kakiuchi

Yoshiaki Kazawa

Kazuo Kuroichi

A conductive transparent probe used in a probe control apparatus for adjusting a distance between the apex of the probe and a sample by vibrating the probe with an vibrator in a direction perpendicular to the axis of the probe is provided. The conductive transparent probe includes: an optical fiber having a taper part at one end; a conductive transparent film formed on the surface of the taper part; a first metal film formed on the surface of the optical fiber other than the taper part; wherein the conductive transparent film and the first metal film are electrically connected, and length and thickness of the first metal film are determined such that the conductive transparent probe vibrates while contacting with the vibrator.

Conductive transparent probe and probe control apparatus

A scanning tunneling microscope includes a probe, an optical waveguide, a photodetector, a bias power supply. The probe includes a tip made of a sharpened light transparent material and arranged to be opposite and perpendicular to a sample incorporating a quantum structure, and a light transparent electrode which covers a surface of the tip and is optically transparent. The optical waveguide has one end arranged on a proximal side of the tip. The photodector is arranged on the other end of the optical waveguide to detect luminescence from the sample. The bias power supply applies a bias voltage between the light transparent electrode and the sample.

Scanning tunneling microscope

An industrial compact synchrotron radiation source includes, for the purpose of prolonging lifetime of a charged particle beam, beam absorbers made of a material having a low photodesorption yield and disposed inside a bending section/vacuum chamber at at least positions upon which the synchrotron radiation is irradiated, and electrically conductive beam stabilizers disposed at positions inside the bending section/vacuum chamber which are distant by a predetermined distance from an orbit of the charged particle beam toward the outer circumferential wall of the bending section/vacuum chamber.

Synchrotron radiation source with beam stabilizers

Synchrotron radiation source

An industrial compact synchrotron radiation source which can improve vacuum evacuation performance to prolong life-time of a charged particle beam and supply highly intensive stable synchrotron radiation. In the source, a charged particle beam bending duct forming a vacuum chamber through which the charged particle beam circulates is encompassed by a bending electromagnet, and at least one SR guide duct for guiding the radiation to outside extends from the outer circumferential wall of the bending duct. The SR guide duct is connected through a gate valve to an SR beam line duct for guiding the SR beam to an object to be worked and a vacuum pump is disposed on the side, close to an orbit of the charged particle beam, of the gate valve. The SR guide duct extending from the outer circumferential wall of the bending duct takes a form of a divergent duct which is widened in accordance with a spreading angle of the SR beam traveling through the SR guide duct.

Growing community of inventors

Isehara, Japan

Toru Murashita