Rigaku Corporation

Toru Mitsunaga

Katsuhiko Inaba

Shintaro Kobayashi

Kazuhiko Omote

Akihiro Himeda

Takeshi Osakabe

Keiichi Morikawa

Hisashi Konaka

Koichi Kajiyoshi

Keigo Nagao

Akira Echizenya

Aya Kuribayashi

Kazuyoshi Arai

Mari Ookawa

Provided are a processing method, a processing apparatus and a processing program which can perform pole figure measurement continuously without overlapping of an angle a in a pole figure with the small number of times of &#x3d5; scan, thereby enabling the efficient measurement. The processing method for determining conditions of pole figure measurement by X-ray diffraction, includes the steps of. receiving input of a diffraction angle 2&#x3b8;; and determining an angle &#x3c9; formed by an incident X-ray and an x-axis, and a tilt angle &#x3c7; of a sample in each &#x3d5; scan for a rotation angle &#x3d5; within a sample plane so as to make a range of an angle a continuous from &#x3b1;=90&#xb0; to &#x3b1;=0&#xb0; without overlapping, the angle &#x3b1; being formed by the sample plane and a scattering vector, the range of the angle &#x3b1; are detectable at a time on a two-dimensional detection plane in the pole figure measurement at the diffraction angle 2&#x3b8;, in which determining the angle &#x3c9; and the tilt angle &#x3c7; is repeated.

Processing method, processing apparatus and processing program configured to determine conditions of pole figure measurement by X-ray diffraction

To provide an X-ray analysis device and a method for optical axis alignment thereof by which measurement time is shortened and measurement cost may be reduced without optical axis alignment at each measurement using an analyzer. The X-ray analysis device includes a sample stage for supporting a sample, an N-dimensional detector, and an analyzer including analyzer crystals. A detection surface of the N-dimensional detector has first and second detection areas, a plurality of optical paths includes a first optical path that directly reaches the first detection area and a second optical path that reaches via the analyzer crystals, and the N-dimensional detector performs a measurement of the first optical path by X-ray detection of the first detection area, and performs a measurement of the second optical path by X-ray detection of the second detection area.

X-ray analysis device and method for optical axis alignment thereof

An X-ray diffraction apparatus includes: an X-ray source (); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source () between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit () allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage () supports the sample S at a position fixed relative to the incident slit ().

X-ray diffraction apparatus

At least two values of an X-ray irradiation width are set for a single specimen. A rocking curve is measured for each of the X-ray irradiation widths. A rocking curve width value is determined for each of the rocking curves. The values of the X-ray irradiation width and the values of the rocking curve width are plotted on a planar coordinate system having a vertical axis representing the rocking curve width value and a horizontal axis representing the X-ray irradiation width value, and a rocking curve width shift line is determined based on the plotted points. A gradient of the rocking curve width shift line is determined. A curvature radius of the specimen is determined based on the gradient. The amount of bowing of a single-crystal substrate under measurement can be measured without a need to move the single-crystal substrate for reliable measurement with a small amount of error.

Method and apparatus for measuring bowing of single-crystal substrate

There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.

X-ray diffraction apparatus and method of measuring X-ray diffraction

An X-ray analysis apparatus having a function for enabling a plurality of measurement methods to be implemented, the X-ray analysis apparatus having: a measurement system capable of implementing a plurality of measurement methods; measurement software for implementing, in a selective manner, each of the measurement methods; a material evaluation table for storing information relating to a material that may be measured, and a name of an evaluation performed on the material; an input device for inputting the information relating to the material; a wizard program for performing computation for selecting the name of an evaluation on the basis of the information relating to the material inputted using the input device; and a wizard program for selecting a corresponding measurement method on the basis of the selected name of the evaluation.

X-ray analysis apparatus

An X-ray intensity correction method makes the background uniform by adjusting a raster element and an X-ray diffractometer. An X-ray intensity correction method for correcting the intensity of diffracted X-rays includes the steps of focusing X-rays on a sample for correction placed at a gonio center, entering fluorescent X-rays excited by the focused X-rays into a raster element formed by polycapillaries and having a unique focal point, detecting the fluorescent X-rays having passed through the raster element; and adjusting the arrangement of the raster element so that the fluorescent X-rays can uniformly be detected regardless of the detecting position. Since fluorescent X-rays are used, it is possible to adjust the position of the raster element because if the focal point of the raster element coincides with the gonio center, the intensity becomes uniform regardless of the detected position.

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Hachioji, Japan

Toru Mitsunaga