Tokyo Electron Limited

Toru Hayasaka

Chishio Koshimizu

Shinji Kubota

Koji Maruyama

Takashi Dokan

Taichi Hirano

A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

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Miyagi, Japan

Toru Hayasaka