Fujifilm Corporation

Fuji Photo Film Company, Limited

Toru Fujimori

Yuki Mizukawa

Toshiaki Aoai

Shiro Tan

Tomotaka Tsuchimura

Kazuto Shimada

Hideki Takakuwa

Kana Fujii

Kunihiko Kodama

Yushi Kaneko

Yoichi Maruyama

Hiroyuki Einaga

Shuji Hirano

Koji Shirakawa

Fumiyuki Nishiyama

Takayuki Ito

Yasumasa Kawabe

Tsukasa Yamanaka

Ryoji Goto

Masashi Ogiyama

Shinichi Kanna

Hiroyuki Mifune

Kenichiro Sato

Kazuyoshi Mizutani

Hidenori Takahashi

Hirotomo Sasaki

Kazuya Uenishi

Shoichiro Yasunami

Takamitsu Tomiga

Hajime Nakao

Nobuo Seto

Hiroo Takizawa

Hideaki Tsubaki

Yasuhiro Kato

Nobuo Suzuki

Tomoya Sasaki

Toru Tsuchihashi

Toshihiro Usa

Masuji Motoki

Wataru Nihashi

Natsumi Yokokawa

Kenji Sugiyama

Yosuke Murakami

Shinichi Sugiyama

Hyou Takahashi

Kimiyasu Morimura

Jiro Yokoyama

Katsuhiro Nishimaki

Yasunori Takata

Shinki Yamada

There are provided a pattern formation method, including:

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.

Chemical amplification resist composition, and mold preparation method and resist film using the same

The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 mgKOH/g to 250 mgKOH/g, a resin B having an acid value of from 26 mgKOH/g to 65 mgKOH/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.

Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor

An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

The invention provides a photosensitive resin composition including a black colorant, a photopolymerizable compound, a resin, a photopolymerization initiator and a solvent, the composition capable of forming a light-shielding color filter having a ratio OD/ODof from 0.5 to 3, where ODis an optical density at a wavelength of 1200 nm and ODis an optical density at a wavelength of 365 nm; and a photosensitive resin composition including titanium black, a photopolymerizable compound, a resin A having an acid value of from 70 to 250 mgKOH/g, a resin B having an acid value of from 26 to 65 mgKOH/g, a photopolymerization initiator, and a solvent.

Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter

An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a basic compound; and (D) a specific compound containing at least two specific alicyclic hydrocarbon groups each substituted with a hydroxyl group.

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

Provided is a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness. A colored photosensitive curing composition, comprising, as its colorant, a dipyrromethene-based metal complex compound obtained from a metal or metal compound and a dipyrromethene-based compound represented by the following Formula (I): wherein in Formula (I), Rto Reach independently represents a hydrogen atom or a substituent group; and Rrepresents a hydrogen or halogen atom, or an alkyl, aryl or heterocyclic group.

Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production

The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of from 6/4 to 3/7 (halogenated copper phthalocyanine pigment/barbituric acid derivative yellow pigment); a colored pattern formed from the green curable composition; a color filter including the colored pattern; a solid-state image sensor including the color filter; and a method of producing the color filter.

Green curable composition, color filter and method of producing same

Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.

Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same

A polymerizable composition including at least a polymerizable compound, a binder polymer, a photopolymerization initiator, and a titanium black dispersion, wherein the mass ratio of the content of the polymerizable compound to the content of the binder polymer is more than 1.

Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device

According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below. 

Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same

The invention provides a dye-containing negative working curable composition comprising at least a dye, a photo polymerization initiator, and as a radical polymerizable monomer, (C-1) an acidic group-containing polyfunctional (meth)acrylic compound having an acid value of 25 mgKOH/g or more, or (C-1) the acidic group-containing polyfunctional (meth)acrylic compound in combination with (C-2) another radical polymerizable compound other than (C-1).

Dye-containing negative working curable composition, color filter and method of producing thereof

Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of Rand Rindependently represents a hydrogen atom or an alkyl group which may have a substituent, and Rrepresents a phenyl group which may have a substituent.

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method

The invention provides a colored photosensitive curing composition useful for color filters in primary colors, including blue, green, and red, having a high molar absorption coefficient and allowing a reduction in film thickness and superior color purity and fastness; the colored photosensitive curing composition including, as its colorant, a dipyrromethene-based metal complex compound or a interconvertible isomer thereof, obtained from a metal or metal compound and a dipyrromethene-based compound represented by Formula (III): 

According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of Rindependently represents a hydrogen atom or an optionally substituted methyl group, Rrepresents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple Rs may be identical to or different from each other.

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith

Growing community of inventors

Shizuoka, Japan

Toru Fujimori