Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Ctf Solar Gmbh

Torsten Werner

Christoph Metzner

Olaf Zywitzki

Henry Morgner

Daniel Hirsch

Klaus Goedicke

Siegfried Schiller

Volker Kirchhoff

Bastian Siepchen

Jonathan Reschke

Jörg Kubusch

Krishnakumar Velappan

Bert Scheffel

Gösta Mattausch

Christian Drost

Rainer Labitzke

Bettina Späth

Christian Kraft

Torsten Kopte

Michael Junghähnel

Lars Klose

Ludwig Decker

Thomas Modes

A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.

Method for depositing a CdTe layer on a substrate

A method for producing a CdTe solar cell is provided, wherein at least the following layers are deposited on a glass substrate within a vacuum chamber: a TCO layer acting as a frontal contact; at least one CdTe layer; a thin layer of a chlorine-containing compound, and an electrically conductive layer acting as a return contact. Here, a maximally 20 nm thick passivation layer made from CdS, in which chemically non-bound oxygen is embedded, is deposited on the TCO layer prior to deposition of at least one CdTe-layer.

Method for producing a CdTe solar cell

An apparatus for generating a hollow cathode arc discharge plasma, including two plasma sources, each including a hollow cathode and an electrode which is associated with the hollow cathode and which has an opening that extends through the electrode, wherein the hollow cathodes of the two plasma sources are connected to a pulse generator which generates a bipolar, medium-frequency pulsed voltage between the two hollow cathodes. Here, in each of the two plasma sources, the hollow cathode is connected in an electrically conducting manner, directly or with interconnection of at least one current direction limiting component, to the associated electrode.

Apparatus for generating a hollow cathode arc discharge plasma

A process and apparatus for plasma-activated electron beam vaporization is rovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.

Process and apparatus for plasma-activated electron beam vaporization

Growing community of inventors

Dresden, Germany

Torsten Werner