Micronic Laser Systems Ab

Other

Torbj&ouml;rn Sandstr&ouml;m

Peter Ekberg

Mattias Israelsson

Ingvar Gustaf Andersson

Leif Odselius

Hubert Karl Lakner

Stefan Gullstrand

Anna-Karin Holm&eacute;r

Peter D&uuml;rr

Kenneth Wilhelmsson

An aspect of the present invention includes a method to print pattern with improved edge acuity. In one embodiment a method for printing fine patterns comprising the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Method for high precision printing of patterns

The present invention relates to a device for homogenizing the spatial intensity distribution of a spatially coherent radiation beam. The device includes a grating arranged in the propagation path of a spatially coherent radiation beam for diffracting the coherent beam and thus decreasing the coherence length of a diffracted radiation beam in a direction orthogonal to the propagation direction of the radiation beam relative to the width of the radiation beam in the orthogonal direction; and a radiation splitting and directing arrangement arranged in the propagation path of the diffracted radiation beam for splitting the diffracted radiation beam into spatially separated portions and for superimposing the spatially separated portions to form a radiation beam having a homogenized spatial intensity distribution.

Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece

The present invention relates to a method for compensating the impact of at least one defective pixel with a known position in a spatial light modulator (SLM) when creating a pattern of the SLM on a work piece covered with a layer sensitive to electromagnetic radiation. A source for emitting electromagnetic radiation is provided. Said radiation is illuminating said SLM having a plurality of modulating elements (pixels). In a writing pass an image of said modulator is projected on said work piece. A compensation for defective pixels in at least one other writing pass is performed. The invention also relates to an apparatus for performing said method.

Defective pixel compensation method

The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.

Beam positioning in microlithography writing

The present invention relates to preparation of patterned reticles to be used as masks in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a masking layer on a reticle. The methods and devices produce small feature dimensions in masks and phase shift masks. The methods described for masks are in many cases applicable to the direct writing on other workpieces having similarly small features, such as semiconductor, cryogenic, magnetic and optical microdevices.

Dual layer reticle blank and manufacturing process

The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle. The invention also relates to a method for patterning a work piece sensitive to electromagnetic radiation.

Growing community of inventors

Pixbo, Sweden

Torbjörn Sandström

Growing community of inventors

Pixbo, Sweden

Torbj&ouml;rn Sandstr&ouml;m

Torbjörn Sandström