Mems Drive, Inc.

Mems Start, LLC

Tony Tang

Roman Gutierrez

Xiaolei Liu

Guiqin Wang

Matthew Ng

A diagnostic mask and method of diagnosing are disclosed. The method includes collecting data from a plurality of sensors in a mask placed on a patient's face such that the mask covers the patient's eyes, the data representing a plurality of health signs of the patient, wherein at least one of the health signs relates to the patient's eyes; and transmitting a signal from the mask, the signal representing the data representing the plurality of health signs.

Diagnostic mask and method

A system and method for manipulating the structural characteristics of a MEMS device include etching a plurality of holes into the surface of a MEMS device, wherein the plurality of holes comprise one or more geometric shapes determined to provide specific structural characteristics desired in the MEMS device.

MEMS grid for manipulating structural parameters of MEMS devices

A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

Simplified MEMS device fabrication process

Systems and methods are provided for super-resolution imaging using 3-axis OIS. A super-resolution image may be created by enabling optical image stabilization (OIS) in three axes using an OIS system on a camera of an image capturing device; capturing an image of a scene using an image sensor of the camera; shifting the image on the image sensor by a predetermined subpixel amount; capturing the subpixel shifted image; and constructing a super-resolution image of the scene using the image and the subpixel shifted image. In one particular implementation, a position sensor may measure a positional drift of the image sensor after capturing the image. Using this measured positional drift, a time sufficient to shift the image sensor by a predetermined subpixel amount may be determined. The OIS may subsequently be disabled in one or two axes for the determined time.

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Arcadia, CA, United States of America

Tony Tang