Siemens Medical Laboratories, Inc.

Matrix Integrated Systems, Inc.

Tony Sie

Gary B Powell

Lothar Heinz

David J Drage

Robert Burror

A parallel plate plasma type etching apparatus is provided with a temperature control chuck 44 so that elevated substrate temperatures are controlled. With an elevated substrate temperature, the reaction rate is increased. With positive temperature control, the likelihood of damage to the semiconductor devices is significantly reduced. The chuck is provided with a large number of equally spaced electrical heaters 72 and control of the heaters is by a temperature sensor 74.

Temperature controlled chuck for elevated temperature etch processing

The collimator assembly comprises a collimator shielding block for blocking undesired X-rays and an insert piece inserted into the shielding block. The insert piece which is made of a material of high atomic number, has an inner conical surface which defines the X-ray cone transmitting the insert piece and therefore the maximum field size which can be obtained for medical treatment. In order to supply different maximum field sizes, there are provided means for easily interchanging the insert in the collimator shielding block with another insert having a different interior conical dimension. By using inserts of different cone angles, which can easily be inserted into the shielding block, for instance by means of a screw thread from below the shielding block, morbid tissues of different sizes can be treated while the surrounding healthy tissue is fully protected.

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Walnut Creek, CA, United States of America

Tony Sie