Martin Marietta Energy Systems, Inc.

Lockheed Martin Energy Systems, Inc.

Agere Systems Inc.

Tony E Haynes

Raymond A Zuhr

Andrzej Golanski

Conor S Rafferty

Hans-Joachim Ludwig Gossmann

Ramki Kalyanaraman

Vincent C Venezia

Maria Lourdes Pelaz-Montes

We have found that under certain prescribed conditions a co-implantation process can be effective in increasing the electrical activation of implanted dopant ions. In accordance with one aspect of our invention, a method of making a semiconductor device includes the steps of providing a single crystal semiconductor body, implanting vacancy-generating, ions into a preselected region of the body, implanting dopant ions into the preselected region, the dopant implant forming interstitial defects in the body, and annealing the body to electrically activate the dopant ions. Importantly, in our method the vacancy-generating implant introduces vacancy defects into the preselected region that are effective to annihilate the interstitial defects. In addition, process steps that amorphize the surface of the implanted region are avoided, and the dose of the vacancy-generating implant is made to be greater than that of the dopant implant. In a preferred embodiment, the peak of the vacancy defect concentration profile substantially overlaps the peak of the dopant implant concentration profile. In another preferred embodiment the peak of the vacancy-generating implant profile is deeper than that of the dopant profile. In accordance with another aspect of our invention, after ion implantation is complete, only low temperature process steps (e.g., steps performed at temperatures no greater than about 800&deg; C. for Si devices) are performed.

Increasing the electrical activation of ion-implanted dopants

An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

Apparatus and method for selective area deposition of thin films on

An electrical device includes a substrate having an ITO coating thereon, a portion of which is conductive and defines at least one electrical pathway, and the balance of the ITO being insulative. The device is made by the following general steps:

Method of forming electrical pathways in indium-tin-oxide coatings

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Knoxville, TN, United States of America

Tony E Haynes