Intel Corporation

Tony Dambrauskas

Edward Rudolph Prack

Danish Faruqui

Aleksandar Aleksov

Mark S Hlad

Yoshihiro Tomita

Sergei L Voronov

Rajen C Dias

Mihir A Oka

Lars D Skoglund

David K Wilkinson, Jr

Wei Ey Li

Edvin Cetegen

Taylor W Gaines

Frederick W Atadana

Hsin-Yu Li

Ralph Lane

Daniel J Kinderknecht

Disclosed herein are structures and techniques for underfill flow management in electronic assemblies. For example, in some embodiments, an electronic assembly may include a first component, a second component, an underfill on the first component and at least partially between the first component and the second component, and a material at a surface of the first component, wherein the material is outside a footprint of the second component, and the underfill contacts the material with a contact angle greater than 50 degrees.

Underfill flow management in electronic assemblies

Embodiments of the present disclosure are directed to die adhesive films for integrated circuit (IC) packaging, as well as methods for forming and removing die adhesive films and package assemblies and systems incorporating such die adhesive films. A die adhesive film may be transparent to a first wavelength of light and photoreactive to a second wavelength of light. In some embodiments, the die adhesive film may be applied to a back or 'inactive' side of a die, and the die surface may be detectable through the die adhesive film. The die adhesive film may be cured and/or marked with laser energy having the second wavelength of light. The die adhesive film may include a thermochromic dye and/or nanoparticles configured to provide laser mark contrast. UV laser energy may be used to remove the die adhesive film in order to expose underlying features such as TSV pads.

Laser die backside film removal for integrated circuit (IC) packaging

Electronic assemblies and their manufacture are described. One embodiment relates to a method including depositing an organic thin film layer on metal bumps on a semiconductor wafer, the organic thin film layer also being formed on a surface adjacent to the metal bumps on the wafer. The wafer is diced into a plurality of semiconductor die structures, the die structures including the organic thin film layer. The semiconductor die structures are attached to substrates, wherein the attaching includes forming a solder bond between the metal bumps on a die structure and bonding pads on a substrate, and wherein the solder bond extends through the organic thin film layer. The organic thin film layer is then exposed to a plasma. Other embodiments are described and claimed.

Organic thin film passivation of metal interconnections

The present invention uses a two step plasma etch process to create a via contact with an integral bump. After the via and bump have been plated, the semiconductor substrate is planarized to remove the excess metal, using the semiconductor substrate as a planar stop. The bulk silicon substrate surrounding the bumps are plasma etched back to expose the bumps for assembly.

Multi-step etch for metal bump formation

A method of manufacturing a coaxial trace () within a surrounding material () includes: providing a first substrate () and a second substrate () composed of the surrounding material; forming a first portion () of the coaxial trace in the first substrate; forming a second portion () of the coaxial trace in the second substrate; aligning the first portion of the coaxial trace with the second portion of the coaxial trace; and bonding the first portion of the coaxial trace to the second portion of the coaxial trace.

Method of manufacturing a coaxial trace in a surrounding material, coaxial trace formed thereby, and semiconducting material containing same

Disclosed are embodiments of a method for forming a seal ring on a substrate that is anchored to the substrate by a number of vias. Also disclosed are embodiments of an assembly including such an anchored seal ring. In some embodiments, a seal ring may extend around the periphery of a MEMS device and may, in combination with a lid, provide a hermitic cavity enclosing the MEMS device. Other embodiments are described and claimed.

Methods for anchoring a seal ring to a substrate using vias and assemblies including an anchored seal ring

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Chandler, AZ, United States of America

Tony Dambrauskas