Asml Netherlands B.v.

Ton De Groot

Jacobus Johannus Leonardus Hendricus Verspay

Ronald Johannes Hultermans

Gerardus Everardus Marie Hannen

Harmen Klaas Van Der Schoot

Hernes Jacobs

Petrus Matthijs Henricus Vosters

An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.

Growing community of inventors

Someren, Netherlands

Ton De Groot