Asahi Glass Company, Limited

Tomoyuki Tsujimura

Manabu Nishizawa

Akio Koike

Hirofumi Tokunaga

Yuichi Kuroki

Kensuke Nagai

Nobuhiro Shinohara

Yasuo Hayashi

Hideki Kushitani

Mineko Yamamoto

Syusaku Akiba

A method of manufacturing a lithium ion conductive glass ceramic, includes a step of forming granules using a material including an SiOsource, a ZrOsource, a POsource and an NaO source; a step of obtaining a powder including a glass ceramic by passing the granules under a heated gas phase atmosphere to melt the granules and solidifying the melted granules; a step of obtaining a target object including a glass ceramic by performing a heat treatment on the powder to precipitate crystals; and a step of obtaining a lithium ion conductive glass ceramic by performing an ion-exchange process on the target object in molten salt including lithium ions.

Method of manufacturing lithium ion conductive glass ceramic

A method of manufacturing a lithium ion conductive solid electrolyte includes (a) a step of preparing an object to be processed including a crystalline material, that includes alkali metal other than lithium and whose ionic conductivity at room temperature is greater than or equal to 1&#xd7;10S/cm; and (b) a step of performing an ion-exchange process on the object to be processed in molten salt including lithium ions.

Method of manufacturing lithium ion conductive solid electrolyte and lithium-ion secondary battery

The present invention relates to an alkali-free glass having a strain point of 725&#xb0; C. or higher, an average thermal expansion coefficient at from 50 to 300&#xb0; C. of from 30&#xd7;10to 40&#xd7;10/&#xb0; C., a temperature Tat which a glass viscosity is 10dPa&#xb7;s of 1,710&#xb0; C. or lower, and a temperature Tat which a glass viscosity is 10dPa&#xb7;s of 1,320&#xb0; C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides, SiO: 66 to 70, AlO: 12 to 15, BO: 0 to 1.5, MgO: more than 9.5 and 13 or less, CaO: 4 to 9, SrO: 0.5 to 4.5, BaO: 0 to 1, and ZrO: 0 to 2, in which MgO+CaO+SrO+BaO is from 17 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, MgO/(MgO+CaO) is 0.4 or more, MgO/(MgO+SrO) is 0.6 or more, and the alkali-free glass does not substantially contain an alkali metal oxide.

Alkali free glass and method for producing alkali free glass

The present invention relates to a non-alkali glass having a strain point of from 710&#xb0; C. to lower than 725&#xb0; C., an average thermal expansion coefficient at from 50 to 300&#xb0; C. of from 30&#xd7;10to 43&#xd7;10/&#xb0; C., a temperature Tat which glass viscosity reaches 10dPa&#xb7;s of 1710&#xb0; C. or lower, a temperature Tat which the glass viscosity reaches 10dPa&#xb7;s of 1320&#xb0; C. or lower, and containing, indicated by mol % on the basis of oxides, SiO66 to 70, AlO12 to 14, BOexceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

Non-alkali glass and method for producing same

The present invention relates to a non-alkali glass having a strain point of from 710&#xb0; C. to lower than 725&#xb0; C., an average thermal expansion coefficient at from 50 to 300&#xb0; C. of from 30&#xd7;10to 43&#xd7;10/&#xb0; C., a temperature Tat which glass viscosity reaches 10dPa&#xb7;s of 1710&#xb0; C. or lower, a temperature Tat which the glass viscosity reaches 10dPd&#xb7;s of 1320&#xb0; C. or lower, and containing, indicated by mol % on the basis of oxides, SiO66 to 70, AlO12 to 14, BOexceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

The present invention relates to an alkali-free glass having a strain point of 735&#xb0; C. or higher, an average thermal expansion coefficient at from 50 to 350&#xb0; C. of from 30&#xd7;10to 40&#xd7;10/&#xb0; C., a temperature Tat which a glass viscosity is 10dPa&#xb7;s of 1,710&#xb0; C. or lower, a temperature Tat which a glass viscosity is 10dPa&#xb7;s of 1,340&#xb0; C. or lower, and a devitrification temperature of 1,330&#xb0; C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides: SiO66 to 69, AlO12 to 15, BO0 to 1.5, MgO 6 to 9.5, CaO 7 to 9, SrO 0.5 to 3, BaO 0 to 1, and ZrO0 to 2, in which MgO+CaO+SrO+BaO is from 16 to 18.2, MgO/(MgO+CaO+SrO+BaO) is 0.35 or more, MgO/(MgO+CaO) is 0.40 or more and less than 0.52, and MgO/(MgO+SrO) is 0.45 or more.

Non-alkali glass, and process for production of non-alkali glass

The present invention relates to a glass plate for a substrate contains, as a glass matrix composition, in mol % on the oxide basis, SiO: 67 to 72, AlO: 1 to 7, BO: 0 to 4, MgO: 11 to 15, CaO: 0 to 3, SrO: 0 to 3, BaO: 0 to 4, ZrO: 0 to 4, NaO: 8 to 15, and KO: 0 to 7, with SiO+AlO: 71 to 77, MgO+CaO+SrO+BaO: 11 to 17, NaO+KO: 8 to 17, and satisfying KO/(NaO+KO)&#x2266;0.13&#xd7;(SiO+AlO+0.5BO+0.3BaO)&#x2212;9.4, in which the glass plate has a &#x3b2;-OH value (mm) of 0.05 to 0.5, and a heat shrinkage ratio (C) of 16 ppm or less.

Glass plate for substrate, method for producing same, and method for producing TFT panel

The present invention provides an alkali-free glass having a high strain point, a low viscosity and low devitrification, which is easily subjected to float molding and fusion molding. The glass herein has a strain point of 725&#xb0; C. or higher, an average thermal expansion coefficient at 50 to 300&#xb0; C. of 30&#xd7;10to 40&#xd7;10/&#xb0; C., a temperature Tat which a glass viscosity becomes 10dPa&#xb7;s of 1,710&#xb0; C. or lower, a temperature Tat which a glass viscosity becomes 10dPa&#xb7;s of 1,330&#xb0; C. or lower, a glass surface devitrification temperature (T) of 1,330&#xb0; C. or lower, and a glass internal devitrification temperature (T) of 1,330&#xb0; C. or lower.

Alkali-free glass and method for producing same

To provide a method whereby it is possible to produce an alkali-free glass having little bubbles therein and excellent in homogeneity and flatness. A method for producing an alkali-free glass, which comprises melting a glass raw material containing a silicon source, followed by forming, wherein as the silicon source, a silica sand is used which has a median particle diameter Dof from 20 &#x3bc;m to 80 &#x3bc;m and which contains particles having a particle diameter of at most 2 &#x3bc;m at a ratio of at most 0.3 vol % and particles having a particle diameter of at least 100 &#x3bc;m at a ratio of at most 2.5 vol %.

Growing community of inventors

Tokyo, Japan

Tomoyuki Tsujimura