Dai Nippon Printing Co., Ltd.

Tomoyuki Tachikawa

Norihito Ito

Norihito Itoh

Kentaro Hoshi

Norihito Itou

Toru Miyake

Kiyoshi Itoh

Shinichi Handa

Takahisa Taniguchi

Anri Takarabe

An adhesive sheet set including a pair of adhesive sheets respectively including an adhesive layer capable of being cured and adhered by being in contact with each other, and a method for producing a product using the same. An adhesive sheet set including a first adhesive sheet and a second adhesive sheet, wherein the first adhesive sheet includes a first separator and a first adhesive layer provided on one surface of the first separator, the second adhesive sheet includes a second separator and a second adhesive layer provided on one surface of the second separator, and the first adhesive sheet and the second adhesive sheet are configured to be cured and adhered by the first adhesive layer and the second adhesive layer being in contact with each other.

Adhesive sheet set and method for producing product

There is provided a method for repairing or reinforcing a structure. The method includes the steps of: providing an adhesive sheet comprising an adhesive layer comprising at least a curable resin composition whose curing is promoted by irradiation with ionizing radiation and a curing aid which generates a basic substance by irradiation with ionizing radiation; attaching the adhesive sheet to a surface of the structure; and curing the adhesive layer of the adhesive sheet in a state where the adhesive layer is exposed.

Method for repairing or reinforcing structure, method for producing repaired or reinforced structure, and adhesive sheet

The present invention provides a method for manufacturing an EL element including an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer, a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Production method for electroluminescent element

An EL element capable of: preventing the state in which number of excessive layers are laminated on each light emitting part formed in a pattern at the time of forming the light emitting parts using the photolithography method; executing the peeling treatment easily and quickly in the excessive layer peeling process; and preventing generation of color mixture or pixel narrowing derived from the elution of the patterned light emitting part into the light emitting layer coating solution to be coated later, at the end part thereof, at the time of coating a light emitting layer coating solution. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electroluminescent element using a photolithography method.

Method for manufacturing electroluminescent element

There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.

Process for producing electroluminescent element

The present invention provides a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. This object is achieved by providing a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

The main object of the present invention is to provide a method for manufacturing an EL element, capable of preventing deterioration of the element characteristic by the developing agent or the rinsing agent, while providing the advantages of the photolithography method of high light emitting efficiency and taking out efficiency, the manufacturing process simplicity, and the highly sophisticated pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an organic EL element comprising at least a patterned organic light emitting layer, wherein the patterning is conducted by etching with a protecting layer pattern laminated on an organic light emitting layer.

Method for fabricating organic EL element

A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.

A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.

Process for production of electroluminescent element and electroluminescent element

Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.

Light emitting element and process for producing the same

A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers. In order to achieve the aforementioned object, the present invention provides a method for manufacturing an electroluminescent element by photolithography, comprising: a process of providing a light-emitting portion of at least one color, having a photoresist layer on a surface thereof, on a substrate; a process of forming a heterochromatic light-emitting layer by coating the substrate with a heterochromatic light-emitting layer forming coating solution which expresses a different color from the color of the above light-emitting portion; a process of forming a photoresist layer for the heterochromatic light-emitting layer by coating the heterochromatic light-emitting layer with a photoresist; a process of pattern-exposing and developing the photoresist layer for the heterochromatic light-emitting layer, such that portions of the photoresist layer for the heterochromatic light-emitting layer which the heterochromatic light-emitting portion is to be formed, are remained; and a process of forming the heterochromatic light-emitting portion, having the photoresist layer for the heterochromatic light-emitting layer on the surface thereof, in a pattern by removing portions of the heterochromatic light-emitting layer which the photoresist layer for the heterochromatic light-emitting layer is removed.

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Tokyo, Japan

Tomoyuki Tachikawa