Tokyo Ohka Kogyo Co., Ltd.

San-Apro Limited

Tomoyuki Shibagaki

Hirofumi Imai

Masahiro Masujima

Takuto Nakao

Yuji Nakamura

Takahiro Kondo

Kenichi Yamagata

A negative photosensitive resin composition containing an epoxy group-containing resin and a cationic polymerization initiator which includes a sulfonium salt represented by General Formula (I0). In Formula (I0), R1 and R2 represent an aryl group, a heterocyclic hydrocarbon group, or an alkyl group. R3 to R5 are an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom. k is an integer of 0 to 4, m is an integer of 0 to 3, and n is an integer of 1 to 4. A is a group represented by —S—, —O—, —SO—, —SO—, or —CO— Xrepresents a monovalent polyatomic anion.

Negative photosensitive resin composition, pattern formation method, and laminated film

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Kyoto, Japan

Tomoyuki Shibagaki