Fujitsu Corporation

Fujitsu Semiconductor Limited

Tomoyuki Okada

Masahiko Minemura

Takahisa Miyamoto

Yuji Kato

Hirofumi Saito

Kenichi Utsumi

Akira Takano

Mitsufumi Naoe

Yoshimasa Iiduka

Seiji Makino

Kenji Kikuchi

Ryo Tsujimura

Koichi Suzuki

Kouichi Suzuki

Naoya Sashida

Kazuhiko Takahashi

Mitsuo Sakurai

Toshihito Kanetsuku

Yoshito Konno

Osamu Ohmori

Kanji Takeuchi

Taketoshi Omata

Takahisa Ito

Yuji Katoh

Kazuya Sugawa

Yukihiro Sato

Kiyokazu Aiso

Yasuhiko Inada

Masao Sugiyama

Tomoaki Kawaguchi

Toru Miyauchi

Yoshimasa Ilduka

Shoko Saito

Tomoaki Inaoka

Masakazu Ohseki

A semiconductor wafer including patterns transferred to a plurality of shot regions of the semiconductor wafer respectively, a plurality of chip regions being formed in the plurality of shot regions respectively, a plurality of first dummy patterns being formed respectively in a first chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of first dummy patterns being arranged repeatedly in a first manner, a plurality of second dummy patterns being formed respectively in a second chip region of the plurality of chip regions of each of the plurality of shot regions, the plurality of second dummy patterns being arranged repeatedly in a second manner different from the first manner.

Semiconductor wafer and method for manufacturing semiconductor device

A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.

Pattern verification method, pattern verification apparatus, and pattern verification program

A computer-implemented method, of processing design data to obtain photomask data, includes: selecting, amongst design data, data representing a first cell; selecting a first area in said first cell for which a configuration of a corresponding first pattern is influenced by patterns arranged outward relative to said first cell area; selecting a second area other than said first area in said first cell; constructing a hierarchical structure for said data representing said first cell area that includes said first area and said second area; subjecting the first area to optical proximity correction on the basis of a relationship between the first pattern and the patterns arranged around said first cell area; performing optical proximity correction in said second area on the basis of the first pattern; and synthesizing the corrected first area and the corrected second area, according to the hierarchical structure, to obtain photomask data.

Photomask data processing method, photomask data processing system and manufacturing method

A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.

Method and system for efficiently verifying optical proximity correction

A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

Pattern image comparison method, pattern image comparison device, and program

A method of generating an exposure pattern for lithography to create a plurality of patterns arranged in a predetermined direction, comprises a step of counting the plurality of patterns along this predetermined direction, and generating a first enlarged pattern by moving the edges to a first direction along the predetermined direction for a pattern with an odd number, and by moving the edges to a second direction, which is opposite to the first direction, for a pattern with an even number, and a step of generating a second enlarged pattern by moving the edges to the second direction for the pattern with an odd number, and by moving the edges to the first direction for the pattern with an even number. And the first and second patterns are used for creating the plurality of original patterns in a lithography step using the respective enlarged patterns.

Wavelength-independent exposure pattern generation method and exposure pattern generation system for lithography

Provided is a computer for producing corrected pattern data which includes corrected features each obtained by adding auxiliary features (serifs) to the right-angle corners of an original feature to compensate for the photo proximity effect. The computer performs the step of: (S ) inputting an original pattern data; (S ) adding triangle or rectangle serifs to right-angle corners of original features, each serif having a side which is an extension of a first side of a corresponding original feature and another side which is a portion of the side adjacent to the first side; (S ) performing a geometric OR operation on the original feature and the serifs to obtain a synthesized feature; and (S ) decomposing the synthesized feature into basic figures which can be processed in an electron beam exposure apparatus.

Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same

A data processing apparatus comprises a grid pattern area calculation section ( ) for calculating the minimum grid and the present area of a circuit element for each layer of circuit patterns given by CAD data ( ); an overlap area calculation section ( ) for calculating an overlap area of present areas; and a composition/division optimization judgment section ( ) for judging by a criterion whether the layers including the overlap area should be processed according to a single common grid or different grids. Each layer can be assigned the grid with the minimum accuracy required for the layer. A grid with more minute accuracy than it requires may not be used. Operation load in making reticle mask data and processing load in actually performing exposure or the like are thereby considerably relieved.

Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium

In order to achieve a drive system having a simple structure in which a cartridge having therein a wound magnetic tape can be supplied or replaced in small installation space, a carrier unit structure is employed in which a cartridge is horizontally retracted from a magazine capable of horizontally inserting/removing the cartridge and then held therein. Further, a drive unit is located beneath the carrier unit, and the cartridge held in the carrier unit is released so that the cartridge can be dropped and loaded into the drive unit.

Drive system equipped with an autoloader mechanism, and autoloading device

A full area of a semiconductor integrated circuit is divided into unit areas, a mask data file for use in a beam exposure system or an inspection apparatus is produced based on CAD data of the full area, full-area header information in which a starting address of a mask data of each unit area relates to positional information on said unit area, partial-area header information corresponding to each of partial areas obtained by division of the full area is produced based on the full-area header information and mask data of the partial areas are extracted from a mask data of the full area based on the partial area header information to produce the mask data files corresponding to the partial area header information.

Method and apparatus of producing partial-area mask data files

In order to achieve a magazine structure in which any necessary cartridge can be removed or inserted while a magazine is mounted in an autoloading device, a carrier unit is equipped with a lock releasing mechanism at the distal ends of openable/closable arms thereof so that a cartridge received in the magazine may be individually released from locking. This prevents any failure on the reading and writing of data due to removal of any wrong cartridge since the cartridge to be released can be defined by a programmable operation of the carrier unit.

Loading device

In order to reliably lock a door element and detect its state, a pressing unit is mounted to a part of a door element so that it may press in the closing direction independently of the door body, and latch means is mounted to the mating part of the door element so that it may be engaged with a distal end of the pressing unit at a distance less than a predetermined spacing to finely move the door element. A projecting part is mounted to the pressing unit so as to project toward the mating part. The mating part includes resilient means acting to repel a force of the projecting part influenced in the direction of the mating part, and a switching element operable to detect the closing state of the door element when the projecting part presses the resilient means with more than a predetermined pressing force.

Door opening/closing mechanism

A cartridge direct entry/exit station for a library apparatus, the library apparatus transferring selected cartridges to a drive unit through a transferring mechanism for processing of information recorded therein. The cartridge direct entry/exit station is configured to accommodate a magazine storing a plurality of cartridges, thereby facilitating the simultaneous entry or exit of plural cartridges. The cartridge direct entry/exit includes a communication space defined to establish direct communication between an operating space in the interior of the library apparatus and an external space of the library apparatus, and a magazine holding mechanism for holding the magazine in a state where an insertion/removal side of the cartridges faces the operating space.

Growing community of inventors

Kawasaki, Japan

Tomoyuki Okada