Nikon Corporation

Nikon Precision Incorporated

Tomoyuki Matsuyama

Osamu Tanitsu

Masakazu Sekiguchi

Masahiro Nei

Koji Shigematsu

Masamitsu Yanagihara

Tetsuya Yamamoto

Hiroyuki Hirota

Satoshi Hagiwara

Isao Totsuka

Jacek K Tyminski

Raluca Popescu

Shigeru Hirukawa

Kousuke Suzuki

Hirohisa Tanaka

Norio Komine

Hisashi Nishinaga

Takehito Kudo

Kenichi Muramatsu

Yasuo Shimizu

Hirotaka Kohno

Shintaro Kudo

Naonori Kita

To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.

Image determining device to determine the state of a subject

A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Lithography system, simulation apparatus, and pattern forming method

To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.

Guidance system, detection device, and position assessment device

There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.

Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether &#x3b4;&#x3c;&#x3b5;, wherein &#x3b4;represents model vs. exposure difference and &#x3b5;represents predetermined criteria. The technique further includes completing the model when &#x3b4;&#x3c;&#x3b5;.

Scanner based optical proximity correction system and method of use

Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.

Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method

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Kitakatsushika-gun, Japan

Tomoyuki Matsuyama