Mitsubishi Rayon Company, Limited

Mitsubishi Chemical Corporation

Tomoya Oshikiri

Atsushi Yasuda

Shinichi Maeda

Daisuke Matsumoto

Keisuke Katou

Hikaru Momose

Miho Chujo

The time when at least a monomer and a chain transfer agent are supplied in a reactor and the solution temperature in the reactor has reached a predetermined polymerization temperature is set as starting time (T), and the time when a process to terminate the polymerization is started is set as ending time (T). A polymerization initiator is supplied into the reactor between (T) and just before [(T)&#x2212;(T)/2] and between [(T)&#x2212;(T)/2] and (T). The total mass of the polymerization initiator supplied to the reactor between (T) and (T) is set as (I), and the total mass of the polymerization initiator supplied between [(T&#x2212;T)/2] and (T) is set as (I). The (I) is set 50 to 100 mass % of the entire polymerization initiator. Using a production method in which 0.50&#x3c;(I)/(I)&#x3c;1.00 is satisfied, a polymer is produced at a high polymerization rate showing less variation of molecular weight and having less amount of chain transfer agent residue remaining at an end of the polymer chain.

Polymer and method for producing same

A target variable analysis unit () calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit () processes NMR measurements, signals, etc. An explanatory variable analysis unit () obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit () determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit () uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.

Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions

Provided is a copolymer for lithography containing a monomer containing an acid leaving group and a monomer not containing an acid leaving group, in which N(v)/Nis from 1.01 to 1.09 and all of N(v)/N, N(v)/N, and N(v)/Nare from 0.95 to 1.05 when, among five fractions obtained by dividing an eluate providing a peak according to the copolymer in an elution curve obtained by GPC in order of elution so as to have an equal volume, ratios of monomer units containing an acid leaving group among the total monomer units constituting a copolymer included in the respective fractions from the first which is eluted earliest to the fourth are denoted as N(v) mol % to N(v) mol %, respectively, and the ratio of the monomer unit containing an acid leaving group among the total monomer units constituting a copolymer included in the sum of the five fractions is denoted as Nmol %.

Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate

A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is &#x2212;3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers.

Polymer for lithography

A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

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Yokohama, Japan

Tomoya Oshikiri