Nitto-denko Corporation

Tomotake Nashiki

Hideo Sugawara

Tomonori Noguchi

Nozomi Fujino

Hidetoshi Yoshitake

Kuniaki Ishibashi

Kazuhiro Nakajima

Motoki Haishi

Akira Hamada

Daiki Kato

Yoshihisa Ito

Hiroaki Kishioka

Yoshimasa Sakata

Tomohide Banba

Kenkichi Yagura

Yoshifumi Asahara

Tsuyoshi Chiba

Masahiro Ooura

Yuka Yamazaki

Daisuke Kajihara

Hironobu Machinaga

Minoru Kanatani

Kodai Miyamoto

Masayoshi Katagiri

Hiroshi Wada

Mitsuru Honjo

Kazuaki Sasa

Kazumasa Igarashi

Eri Ueda

Kenta Watanabe

Mizue Nagata

Hidehiko Andou

Hideyuki Yonezawa

Naoki Nagaoka

Mizue Yamasaki

Yuki Hasegawa

Tomoya Matsuda

Yoko Muraoka

Tsukasa Miyazaki

Yuki Tsubaki

Rie Kawakami

Ishibashi Kuniaki

A conductive film () includes: a resin film base () having a hard coat layer () on one main surface of a resin film (); an underlying layer () on a hard coat layer-formed surface of the resin film base; and a metal thin film () on the underlying layer. The underlying layer includes at least one layer of inorganic dielectric thin film. The hard coat layer contains first fine particles having an average primary particle diameter of 10 to 100 nm. In a cross section of the hard coat layer, the proportion of an area occupied by the first fine particles is preferably 10% or more.

Conductive film, method for manufacturing conductive film, and temperature sensor film

An electrochromic light adjusting member sequentially includes a transparent substrate, a light transmitting electrically conductive layer, and an electrochromic light adjusting layer. The light transmitting electrically conductive layer sequentially includes a first indium-based electrically conductive oxide layer, a metal layer, and a second indium-based electrically conductive oxide layer.

Electrochromic light adjusting member, light transmitting electrically conductive film, and electrochromic light adjusting element

The anti-reflection film includes an anti-reflection layer composed of multilayer thin-films having different refractive indexes on one principal surface of a transparent film substrate. The moisture permeability of the anti-reflection film is 15 to 1000 g/m&#xb7;24 h. The surface of the anti-reflection layer has an indentation elastic modulus of 20 to 100 GPa, and an arithmetic mean roughness Ra of 3 nm or less. The arithmetic mean roughness Ra of the surface of the anti-reflection layer is preferably 1.5 nm or less. The thin-films constituting the anti-reflection layer can be deposited by, for example, a sputtering method.

Reflection preventing film and method for manufacturing same, and reflection preventing layer- attached polarization plate

The light transmitting conductive film includes a light transmitting substrate and a non-crystal light transmitting conductive layer, wherein the conditions (1) to (3) below are satisfied when the non-crystal light transmitting conductive layer has a carrier density of Xa&#xd7;10(/cm) and a hole mobility of Ya (cm/V&#xb7;s); a heated light transmitting conductive layer has a carrier density of Xc&#xd7;10(/cm) and a hole mobility of Yc (cm/V&#xb7;s), wherein the heated light transmitting conductive layer is the non-crystal light transmitting conductive layer after going through heating; and a moving distance L is {(Xc&#x2212;Xa)+(Yc&#x2212;Ya)}:

Light transmitting conductive film and light control film

A light modulation film () includes a light modulation layer () whose state is reversibly changed between a transparent state by hydrogenation and a reflective state by dehydrogenation, and a catalyst layer () that promotes hydrogenation and dehydrogenation in the light modulation layer, in this order on a polymer film substrate (). light modulation layer () includes a light modulation region () having a thickness of 10 nm or more on a catalyst layer ()-side, and an oxidized region () on a polymer film substrate ()-side.

Light modulation film and method for manufacturing same, and light modulation element

The light modulation film () is a hydrogen-activation-type light modulation film that includes an inorganic oxide layer (), a light modulation layer () and a catalyst layer (), in this order on a polymer film substrate (). The light modulation layer () is a layer for reversibly changing states between a transparent state due to hydrogenation and a reflective state due to dehydrogenation. The catalyst layer () promotes hydrogenation and dehydrogenation in the light modulation layer. The inorganic oxide layer () contains an oxide of an element different from a metal element that constitutes the light modulation layer ().

Light-modulating film and method for producing same, and light-modulating element

There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13&#xd7;10atoms/cmor less; and the transparent conductive layer has a specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 2.8&#xd7;10&#x3a9;&#xb7;cm or less.

Transparent conductive film and method for producing the same

A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference &#x394;E between a pattern portion and a non-pattern portion is 7.0 or less.

Transparent conductive film

A transparent conductive filmincludes, in this order, a transparent substrate, a first optical adjustment layer, an inorganic layer, and a transparent conductive layer. The first optical adjustment layerhas refractive index nC lower than refractive index nA of the transparent substrate, and thickness TC of 10 nm or more and 35 nm or less. The inorganic layerhas refractive index nD that is lower than the absolute value |nC&#xd7;1.13| of a value obtained by multiplying the refractive index nC of the first optical adjustment layerby 1.13.

A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Transparent electroconductive film with protective film

Disclosed is a polarizing plate with a pressure sensitive adhesive including an infrared reflecting layer and a pressure sensitive adhesive layer in this over on one surface of a polarizer. The pressure sensitive adhesive layer is an outermost surface layer of the polarizing plate with a pressure sensitive adhesive. The polarizing plate with a pressure sensitive adhesive may further include a quarter wave plate.

Polarizing plate with pressure sensitive adhesive, front protective plate and image display device

Provided is a capacitive touch panel which has enhanced sensitivity and is usable in an image display panel, etc. in this capacitive touch panel, a window, a first transparent film having a first transparent conductive electrode pattern formed on one surface thereof, and a second transparent film having a second transparent conductive electrode pattern which is formed on one surface thereof and disposed with respect to the first transparent film in such a manner as to allow a capacitance to be formed therebetween, are stacked in turn. The capacitive touch panel comprises a first transparent inter-layer resin provided between the window and the first transparent film, and a second transparent inter-layer resin provided between the first transparent film and the second transparent film, wherein the first transparent inter-layer resin has a dielectric constant greater than that of the second transparent inter-layer resin.

Capacitive touch panel

There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiOfilm from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cmor more and 2.8 g/cmor less. The transparent conductive layer has specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 3.8&#xd7;10&#x3a9;&#xb7;cm or less.

The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a patterned transparent conductive layer formed on one side of the transparent film substrate; and a colored layer provided on at least one of an opposite side of the transparent conductive layer from the transparent film substrate and an opposite side of the transparent film substrate from the transparent conductive layer, wherein the colored layer has an average absorptance of from 35% to 90% for light in the wavelength range of from 380 nm to 780 nm.

Transparent conductive film and touch panel

A maintenance method for a sputtering device includes the steps of: moving a cathode carriage to take a plurality of targets and a plurality of cathodes out of a vacuum chamber; operating a plurality of cathode rotating apparatuses to rotate the targets and the cathodes so as to cause the targets to face upwards; operating a plurality of cathode sliding apparatuses to move the targets and the cathodes located in places at high height to places at low height; removing the targets from the cathodes to attach a plurality of new targets to the cathodes; returning the targets and the cathodes to an original height thereof; returning the targets and the cathodes to original rotation angles; and putting the targets and the cathodes back into the vacuum chamber.

Growing community of inventors

Ibaraki, Japan

Tomotake Nashiki