Canon Kabushiki Kaisha

Tomonori Tsukahara

Takuji Maruta

Hiroaki Itabashi

Ryo Nakamichi

A lithography apparatus includes a formation unit that forms an alignment mark on a substrate by irradiating the substrate that includes a photosensitizer with light, and a transfer unit that aligns the substrate on the basis of the position of the alignment mark and that transfers a pattern to the substrate by illuminating the photosensitizer with exposure light. The formation unit irradiates a material of a grounding of the photosensitizer with irradiation light at a wavelength that differs from that of the exposure light and forms the alignment mark on the material by processing the material with energy of the irradiation light.

Growing community of inventors

Kanuma, Japan

Tomonori Tsukahara