Nitto-denko Corporation

Tomonori Noguchi

Tomotake Nashiki

Hideo Sugawara

Motoki Haishi

Kuniaki Ishibashi

Yoshifumi Asahara

Hidetoshi Yoshitake

Hidehiko Andou

Kazuo Kitada

Atsushi Hino

Kanji Nishida

Takaichi Amano

Daisuke Kajihara

Seiji Umemoto

Tadayuki Kameyama

Katsunori Takada

Akira Hamada

Hiroyuki Takao

Kiichi Shimodaira

Daisuke Hamamoto

Yoshihisa Ito

Ishibashi Kuniaki

An impact-absorbing pressure-sensitive adhesive sheet according to an embodiment of the present invention includes an impact-absorbing pressure-sensitive adhesive layer including an impact-absorbing layer. A side surface of the impact-absorbing pressure-sensitive adhesive layer includes a tapered surface; and the tapered surface has a taper angle of 65&#xb0; or more.

Impact-absorbing pressure-sensitive adhesive sheet and method of producing the same

A method for producing a transparent conductive film includes heat-treating a transparent conductive film comprising a transparent film substrate and a transparent conductive laminate including a first transparent conductive layer and a second transparent conductive layer, so that the first and the second transparent conductive layers in the transparent conductive film are crystallized, wherein the first transparent conductive layer is a first amorphous layer comprising indium oxide or an indium-based complex oxide having a tetravalent metal element oxide, the second transparent conductive layer is a second amorphous layer comprising an indium-based complex oxide having a tetravalent metal element oxide, wherein each of the first and the second contents of the tetravalent metal element oxide content is expressed by the formula: {the amount of the tetravalent metal element oxide/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}&#xd7;100(%).

Method for production of transparent conductive film

A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time.

Transparent conductive film and touch panel therewith

There is provided a transparent conductive film which comprises: a film substrate; a plurality of transparent conductor patterns formed on the film substrate; and a pressure-sensitive adhesive layer wherein the transparent conductor patterns are embedded. The plurality of transparent conductor patterns respectively have a two-layer structure wherein a first indium tin oxide layer and a second indium tin oxide layer are laminated on the film substrate in this order, and the first indium tin oxide layer has a greater tin oxide content than the second indium tin oxide layer does. The first indium tin oxide layer has a smaller thickness than the second indium tin oxide layer does.

Transparent conductive film

A transparent crystalline electrically-conductive thin film of the present invention comprises an indium tin oxide as a main component, wherein the indium tin oxide contains 9% by weight or less of tin oxide based on the total amount of indium oxide and tin oxide, wherein the transparent crystalline electrically-conductive thin film contains 0.45 atomic % or less of nitrogen. The transparent crystalline electrically-conductive thin film of the present invention has a high resistance value and good reliability in a high-temperature, high-humidity environment.

Transparent crystalline electrically-conductive thin film, method of production thereof, transparent electrically-conductive film, and touch panel

A method of continuously subjecting an elongated substrate to vacuum film formation is disclosed. The method comprises the steps of: feeding a first substrate from a first roll chamber in a first direction from the first chamber toward a second roll chamber; degassing the first substrate; forming a film of a second material on the first substrate, in a second film formation chamber; and rolling up the first substrate in the second roll chamber, thereby producing the first substrate, and further comprises similar steps to produce a second substrate. In advance of producing the first substrate with the second material film, the first cathode electrode of the first film formation chamber is removed from the first film formation chamber, and, in advance of producing the second substrate with the first material film, the second cathode electrode of the second film formation chamber is removed from the second film formation chamber.

Vacuum film formation method and laminate obtained by the method

A transparent conductive film comprises: a film substrate having two main surfaces; and a transparent conductor layer formed on one main surface of the film substrate. The transparent conductor layer is composed of three layers in which a first indium tin oxide layer, a second indium tin oxide layer, and a third indium tin oxide layer are laminated in this order from the film substrate side. The first indium tin oxide layer has a smaller tin oxide content than the second indium tin oxide layer has. The third indium tin oxide layer has a smaller tin oxide content than the second indium tin oxide layer has.

Transparent conductive film, method for production thereof and touch panel therewith

A method for producing a transparent conductive film including a transparent film substrate and a crystalline transparent conductive layer, including: a first depositing a first indium-based complex oxide having a first tetravalent metal element oxide on the transparent film substrate; and a second depositing indium oxide or a second indium-based complex oxide and lower than the tetravalent metal element oxide content of the indium-based complex oxide used in the first depositing by sputtering to form an amorphous transparent conductive layer, and crystallizing the amorphous transparent conductive layer. The method allows a reduction in crystallization time.

Method for producing transparent conductive film

A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 &#x3bc;m, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n&#x3c;n&#x2266;nis satisfied, where nis the refractive index of the first transparent dielectric thin film, nis the refractive index of the second transparent dielectric thin film, and nis the refractive index of the transparent conductive thin film, suppresses coloration of transmitted light and is produced with high productivity.

Transparent conductive laminated body

A transparent conductive film of the present invention comprises: a transparent film substrate; a hard-coating layer provided on one side of the transparent film substrate; and a transparent conductive thin layer provided on another side of the transparent film substrate, wherein the hard-coating layer is made from a material containing a urethane acrylate, a polyol (meth)acrylate and a (meth)acrylic polymer having an alkyl group containing two or more hydroxyl groups. The transparent conductive film of the present invention has good scratch resistance.

Transparent conductive film and touch panel

A process for producing a transparent conductive laminate having a completely crystallized, transparent conductive layer on a substrate comprising an organic polymer molding is provided. The transparent conductive layer is excellent in transparency and wet heat confidence, is not excessively low in specific resistivity, and has no variation on optical properties such as retardation characteristic. The transparent conductive laminate is obtained by sputter-film forming a transparent conductive layer on a substrate comprising an organic polymer molding under conditions of a substrate temperature of 80-150&#xb0; C. and a degree of vacuum of 8&#xd7;10Pa or lower to form an amorphous transparent conductive layer comprising an In.Sn composite oxide having an amount of Sn atom of 1-6 % by weight based on the total weight of In atom and Sn atom and having a film thickness of 15-30 nm, a Hall mobility of 15-28 cmV&#xb7;S, and a carrier density of 2&#xd7;10/cmto 5&#xd7;10/cm, and heat treating the layer at a temperature lower than 120&#xb0; C., to convert it into a completely crystallized transparent conductive layer having a Hall mobility of 30-45 cm/V&#xb7;S and a carrier density of 2&#xd7;10/cmto 7&#xd7;10/cm.

Growing community of inventors

Ibaraki, Japan

Tomonori Noguchi