Fujifilm Corporation

Fuji Photo Film Company, Limited

Tomonari Ogawa

Kazuhiko Nojo

Seiji Ishizuka

Takashi Nawano

Shinji Hikita

Hidetomo Itoh

Toshio Shibata

Tatsuya Oba

Keisuke Oku

Yoshihito Hodosawa

Takahiro Nakazawa

Takahiro Hayashi

Shuichi Endo

Atsushi Kodou

Youichi Hasegawa

Takayuki Nakanishi

Masafusa Murakami

The present invention provides an antibacterial composition capable of forming an antibacterial film having suppressed coloration, excellent antibacterial property, and suppressed film cracking, antibacterial film, and an antibacterial film-attached substrate. The antibacterial composition of the present invention includes a silver-based antibacterial agent containing zirconium phosphate and silver carried and supported on the zirconium phosphate, a monomer having a polymerizable group, and a solvent. The monomer having a polymerizable group includes a first monomer having a polymerizable group and a hydrophilic group, and a second monomer having a polymerizable group and having no hydrophilic group, and the content of the first monomer is 30% to 70% by mass with respect to the total mass of the monomer having a polymerizable group.

Antibacterial composition, antibacterial film, and antibacterial film-attached substrate

The wavelength conversion member includes: a first substrate; a second substrate; and a wavelength conversion layer disposed between the first substrate and the second substrate and including quantum dots which are excited by excitation light to emit fluorescence. The wavelength conversion layer is a cured layer obtained by curing a polymerizable composition which includes the quantum dots and a polymerizable compound having a molecular weight of 200 or lower, and the number of bubble-shaped defects having a diameter of 0.1 mm or more in the wavelength conversion layer is less than 10 per 100 cm.

Wavelength conversion member, backlight unit including wavelength conversion member, liquid crystal display device, and method of manufacturing wavelength conversion member

In an aspect of the coating method according to the present invention, the lower limit decompression degree Pat which a seam trouble occurs is obtained from the formula of the viscocapillary model. According to the aspect of the present invention, coating is performed by setting the Pso as to satisfy P&#x3c;P&#x2212;P&#x2266;P+0.2, and therefore, stepped unevenness can be effectively suppressed so that a seam trouble does not occur. It goes without saying that the aspect of the present invention can be applied to high viscosity/thick film coating, but it is effective especially in the case where a coating solution with low viscosity (for example, 0.005 Pa&#xb7;s or lower) is coated to be an ultra-thin film (for example, 10 &#x3bc;m or less in the wet film thickness) where stepped unevenness easily occurs.

Coating method of coating solution

The coating apparatus includes a base for supporting a slot die, wherein the base has a height of not more than 5 m from a ground level, and a mean cross sectional area of not less than 3 min terms of a horizontal direction.

Coating apparatus, coating method, and method for manufacturing optical film

A gravure coating apparatus containing a gravure roll, a manifold block for continuously coating a solution on an outer peripheral surface of the gravure rollby immersing a lower part of the outer peripheral surface in the solution, and a doctor blade for scraping off excess solution, a surface of a flexible strip support conveyed to the gravure roll being made in contact with the outer peripheral surface of the gravure roll to transfer and coat a prescribed amount of the solution on the surface of the flexible strip support. The apparatus further contains a dam block which extends from the manifold block on a side where the outer peripheral surface of the gravure roll moves out from the manifold block by rotation of the gravure roll.

Gravure coating apparatus

The coating construction has flexibility corresponding to the number of layers of multiple coating layers, by which a multilayer coating film can be produced with small film thickness without adherence of dust to a film surface, a drying fault such as unevenness induced by drying-wind on the film surface, or a coating fault such as a level variation and a streak. The multilayer coating film has a coating surface state of high quality with coating thickness deviation of 3% or less. A coating device is constructed in which at least a feed roller, a coater and a dryer are integrally incorporated in a casing, and the coating device is given a function as an independent device, whereby the production apparatus of the multilayer coating film can be constructed by only appropriately placing as many coating devices as the number corresponding to the number of layers of the multiple coating layers formed on a web between a delivery device and a winder.

Production apparatus of multilayer coating film

A coating device for coating a coating solution on a web has a roller and a weir which partially constructs a solution store space. In the solution store space the coating solution is stored. When the web sequentially moves in a direction, the roller rotates and the solution in the solution store space is supplied on the web. Thereby a part of the solution overflows the weir such that another part of the solution may remain on the web to have a constant width in a widthwise direction of the web. A drying device has plural drying zones in which the web is fed after the coating of the coating solution. One of the drying zones is neighbored to the coating device. A top of the plural drying zones is constructed of a blow regulation member so as to confront to the solution on the web. The blow regulation member has holes through which is exhausted a gas evaporated from the layer of the solution on the web.

Growing community of inventors

Kanagawa, Japan

Tomonari Ogawa