Canon Kabushiki Kaisha

Tomomi Funayoshi

Takuro Yamazaki

Masayoshi Fujimoto

Hiromitsu Yamaguchi

Kenichi Kobayashi

Tatsuya Hayashi

Atsushi Takagi

Yoya Muraguchi

Hiroshi Sato

Atsushi Kimura

Hiroyuki Koide

Toshihiko Nishida

Yoshio Suzaki

Ryosuke Hamamoto

In order to realize an imprint method capable of reducing a drawback caused by protrusion of an imprint material, the imprint method includes a first pattern forming process of bringing a mold into contact with an imprint material on a first pattern forming region on a substrate; a first exposure process of exposing an imprint material on the first pattern forming region and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller; a second pattern forming process of bringing the mold into contact with an imprint material on a second pattern forming region after the first pattern forming process to form a pattern; and a second exposure process of exposing the imprint material on the second pattern forming region and the imprint material on the partial region of the first pattern forming region.

Imprint method and method for manufacturing article

The present invention provides an imprint apparatus forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus including an optical system applying, to a peripheral region, irradiation light acing to increase viscosity of the imprint material, the peripheral region including an end of a mesa portion of the mold and surrounding the mesa portion in a state in which the mesa portion of the mold is held in contact with the imprint material, and a control unit controlling the optical system such that timings of applying the irradiation light to a plurality of zones in the peripheral region are different from each other, the zones being positioned at different distances from a center of the mesa portion, in the state in which the mesa portion of the mold is held in contact with the imprint material on the substrate.

Imprint apparatuses and article manufacturing methods applying viscosity increases without curing of imprint material

An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold includes a mold holder that holds the mold and an optical system that irradiates the imprint material on the substrate with irradiation light for increasing a viscosity of the imprint material. The irradiation light has a light intensity distribution such that a light intensity increases from a center of a pattern portion of the mold toward a side surface of the pattern portion when the mold is held by the mold holder. The imprint material that moves from the center of the pattern portion of the mold toward the side surface of the pattern portion in a region including the side surface of the pattern portion of the mold is irradiated with the irradiation light while the mold and the imprint material on the substrate are in contact with each other.

Imprint apparatus and method for manufacturing article

The present invention provides a mold including a pattern to be transferred to an imprint material on a substrate using an imprint apparatus, the mold including: a pattern region in which the pattern is arranged; and a peripheral region surrounding the pattern region and configured to shield light, wherein the pattern region includes a first portion, which is arranged with a mark used to measure a relative position with respect to a substrate mark provided on the substrate and through which an image of the substrate mark passes, and a second portion through which an image of a stage mark provided on a stage holding the substrate passes.

Mold, imprint apparatus, and method of manufacturing article

A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.

Template for imprint and imprint method using template

The present invention provides an imprint system including a processing unit configured to perform an imprint process, the processing unit including a dispenser configured to supply a droplet of an imprint material onto a substrate, a library configured to manage a plurality of different maps each indicating at least one of a supply position and a supply amount for a droplet to be supplied on the substrate from the dispenser, and a control unit configured to select one map to be used in the imprint process from the plurality of maps managed in the library based on information about a change of a result of the imprint process caused by a temporal change of at least one of a mold and the dispenser.

Imprint system and method of manufacturing article

The present invention provides an imprint apparatus including a supply device including discharge ports which discharge a imprint material, and configured to supply the imprint material onto a substrate via the discharge ports, and a controller configured to cause, if there is a defective discharge port of the discharge ports, the supply device to discharge the imprint material from another discharge port, different from the defective discharge port, of the discharge ports, wherein a mold for the molding includes a line pattern, and the controller is configured to control the supply device such that an interval between supply positions of the imprint material do not become larger in a direction orthogonal to a direction along the line pattern than that before change from the defective discharge port to the other discharge port.

Imprint apparatus and method of manufacturing article

The present invention provides an imprint system which performs an imprint process of forming a pattern of an imprint material on the substrate by using a mold, the system comprising a plurality of processing units each including a dispenser which supplies the imprint material onto the substrate and configured to perform the imprint process, a library configured to manage a plurality of pieces of layout information, and a control unit configured to, when the mold used by a first processing unit is used by a second processing unit, control the second processing unit, based on a difference in condition for the imprint process between the first and second processing units, by using layout information having a difference corresponding to the difference in condition for the imprint process with respect to layout information used by the first processing unit.

The present invention provides an imprint apparatus which forms a pattern in an imprint material on a substrate by using a mold, the apparatus including a tilt unit configured to tilt the mold and the substrate relatively, a detection unit configured to detect an interference pattern between light reflected by the mold and light reflected by the substrate, and a control unit configured to control, based on the interference pattern detected by the detection unit in a state in which the mold and the imprint material on the substrate are in contact with each other, the tilt unit to reduce relative tilts between the mold and the substrate in the state.

Imprint apparatus, imprint method, and method of manufacturing article

Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to move along a horizontal plane while carrying the substrate, and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate. The adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation. The information related to the state of the imprint material on the substrate is variable with the movement of the moving unit.

Imprinting apparatus, imprinting method, and article manufacturing method

An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

Growing community of inventors

Utsunomiya, Japan

Tomomi Funayoshi