Fujifilm Corporation

Canon Kabushiki Kaisha

Tomoki Matsuda

Akinori Shibuya

Shohei Kataoka

Toshiaki Fukuhara

Yoko Tokugawa

Akiyoshi Goto

Mitsuhiro Fujita

Naohiro Tango

Junichi Ito

Kaoru Iwato

Takaaki Tsuruya

Shuhei Yamaguchi

Kei Yamamoto

Shinichi Sugiyama

Yusuke Iizuka

Masahiro Yoshidome

A fixing member includes a conductive layer including a plurality of conductive elements. In a direction of a generatrix of the fixing member, when an area through which a recording material with a maximum width conveyable to the fixing member passes is referred to as a first area, the first area includes a central area and an end portion area. The central area includes a central portion of the first area in the direction of the generatrix. The end portion area includes an end portion of the first area in the direction of the generatrix. A resistance value of each of the plurality of conductive elements disposed in the central area is a first resistance value. A resistance value of each of the plurality of conductive elements disposed in the end portion area is a second resistance value that is lower than the first resistance value.

Fixing member and fixing unit

According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including 

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Pattern forming method, method for manufacturing electronic device, and electronic device

An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below. 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem. 1]R-AX&#x2003;&#x2003;(I)

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method

Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below. 

Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) an onium salt containing a nitrogen atom in its cation moiety, which onium salt when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and (C) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of compounds of general formulae (1-1) and (1-2) below. 

An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided. The actinic-ray-sensitive or radiation-sensitive resin composition contains: 

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device

Growing community of inventors

Shizuoka, Japan

Tomoki Matsuda