Tokyo Electron Limited

Tomohisa Kimoto

Eiichi Komori

Yuichi Furuya

Hiroyuki Mori

Kensaku Narushima

Einosuke Tsuda

Takashi Kakegawa

Takuya Kawaguchi

Kouichi Sekido

Hideaki Fujita

Noriyuki Watanabe

A raw material supply apparatus includes: a raw material supply path through which a raw material gas is supplied into a processing container; a valve provided in the raw material supply path; a pressure sensor configured to detect an internal pressure of the raw material supply path; a raw material exhaust path connected to the raw material supply path and through which the raw material gas in the raw material supply path is exhausted; an opening degree adjustment mechanism provided in the raw material exhaust path and configured to control the internal pressure of the raw material supply path based on an adjustment of an opening degree of the opening degree adjustment mechanism; and a controller configured to perform the adjustment of the opening degree of the opening degree adjustment mechanism based on a value detected by the pressure sensor.

Raw material supply apparatus and film forming apparatus

There is provided a pipe heating device, including; a sensor installed in a gas pipe; a heating part having a heat generation portion arranged so as to cover the gas pipe except for a region of the gas pipe where the sensor is installed; and a heat conducting member attached between an outer peripheral surface of the gas pipe and the sensor and formed of a material having a higher thermal conductivity than the gas pipe.

Pipe heating device and substrate processing apparatus

A valve device includes: valves configured to control a flow of processing gases supplied to a process vessel; a housing in which first flow paths through which the processing gases flow are formed; a heat diffuser configured to cover the housing and diffuse heat of the housing; a heating part configured to cover the housing covered with the heat diffuser and heat the housing via the heat diffuser; a supply configured to supply a coolant to a second flow path formed between the housing and the heat diffuser; and a controller configure to control the heating part to heat the housing to a first temperature when a predetermined process is performed on a target substrate, and before a start of a cleaning process of the process vessel, control the heating part to stop heating of the housing and control the supply to supply the coolant to the second flow path.

Valve device, processing apparatus, and control method

A source material container includes a housing, a tray assembly and a plurality of cylindrical members. The housing provides a carrier gas introduction port and an opening through which a gas containing source material vapor is outputted. The tray assembly trays stacked in the housing. The cylindrical members are arranged in a radial direction between the tray assembly and the housing. The outermost cylindrical member provides a slit and each of the other cylindrical members than the outermost cylindrical member provides a plurality of slits. From the introduction port to the gap between the tray assembly and the innermost cylindrical member, the flow path of the carrier gas is branched in a stepwise manner in the height direction.

Source material container

Growing community of inventors

Nirasaki, Japan

Tomohisa Kimoto