Canon Kabushiki Kaisha

Tomohiro Harayama

Kouji Yoshida

Keiji Emoto

Satoshi Akimoto

Mitsuo Hirata

Kunihiko Asada

Takashi Meguro

Dai Nagatani

Yuichi Ozawa

An imprint apparatus includes a mold holder that holds a mold, a substrate holder that holds a substrate by suction, a driving device that brings the mold into contact with an imprint material on the substrate by relatively bringing the mold holder and the substrate holder close to each other, and a controller. The controller controls the driving device so as to bring the mold into contact with the imprint material in a state in which the substrate is deformed into a convex shape with respect to the mold by controlling pressures inside the plurality of suction regions based on surface shape data of the substrate held by the substrate holder.

Imprint apparatus and article manufacturing method

Provided is a coating apparatus that includes: a discharge unit that discharges a liquid on an object; a measurement unit that is able to be disposed at a position facing a discharge surface of the discharge unit and measures a height position of the discharge surface using the facing position as a reference position; and a controller that calculates a thickness of an attached substance containing a material of the liquid attached to the discharge surface based on the height position measured by the measurement unit and determines implementation of a maintenance treatment based on the calculated thickness of the attached substance.

Coating apparatus, imprint apparatus, and method of manufacturing article

The present invention provides an exposure apparatus including a stage control system configured to control a stage for holding a substrate in accordance with a command value, a specifying unit configured to specify an exposure start time at which exposure on the substrate starts upon detecting exposure light illuminated on the substrate, and a main control system configured to calculate positions of the stage at a plurality of times in an exposure period for the substrate based on position information of the stage at an exposure start time specified by the specifying unit, obtain an average position of the stage in at least a partial period in the exposure period from the calculated positions of the stage at the plurality of times, and give a command value for matching the average position of the stage with a target position to the stage control system.

Exposure apparatus and method of manufacturing device

A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.

The present invention provides a control apparatus including a feed-forward controller configured to perform feed-forward control of a controlled object, the apparatus being configured to obtain a first response data sequence of the controlled object measured by applying a first manipulated variable to the controlled object, and determining, assuming that a second response data sequence of the controlled object to be obtained if a second manipulated variable data sequence, obtained by respectively multiplying the first manipulated variable by gains as variables which can vary with time, is applied to the controlled object, is expressed as a linear combination of the first response data sequence with the gains as coefficients of the liner combination, the gains so that a discrepancy between the second response data sequence and a target data sequence falls within a tolerance.

Control apparatus, lithography apparatus, and method of manufacturing article

The present invention provides an exposure apparatus which exposes a substrate to light, the apparatus comprising a substrate stage, a position measurement unit configured to measure a position of the substrate stage, a structure configured to support the position measurement unit, a force measurement unit configured to measure a force that acts on the structure, a correction unit configured to correct a command for controlling the position of the substrate stage, based on the measurement value obtained by the force measurement unit, and a correction coefficient, and a calculation unit configured to calculate the correction coefficient based on position deviation information between adjacent shot regions in an evaluation substrate including a plurality of shot regions exposed without correction by the correction unit, and the measurement value obtained by the force measurement unit in exposing each shot region.

Exposure apparatus, calibration method, and method of manufacturing article

An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage.

Scanning exposure apparatus and device manufacturing method

An exposure apparatus which includes a projection optical system configured to project a pattern of a reticle onto a substrate and exposes the substrate to light via the reticle and the projection optical system with a gap between the projection optical system and the substrate filled with liquid, comprises a liquid immersion system configured to supply the liquid to the gap and to recover the liquid from the gap; and a generator configured to generate at least one of an electric field and magnetic field in a path of the liquid of the liquid immersion system.

Growing community of inventors

Utsunomiya, Japan

Tomohiro Harayama