Chisso Corporation

Chisso Petrochemical Corporation

Jnc Corporation

Tomohiro Etou

Ryushi Shundo

Kazutoshi Miyazawa

Hiromichi Inoue

Eiji Watanabe

Takashi Kato

Masami Kimura

Kazuhiko Saigusa

Yuuki Kimura

Yuki Okamoto

Yuki Kimura

Ryouta Mineo

Manabu Kondo

The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.

Positive photosensitive composition

A material of cured film, a thermosetting film and a display device are provided. The thermosetting composition includes a solvent and at least one siloxane polymer selected from the group consisting of siloxane polymer (A) obtained by hydrolyzing or condensing a silane mixture containing a monofunctional silane represented by formula (1) and a trifunctional silane represented by formula (2), and siloxane polymer (B) obtained by hydrolyzing or condensing a silane mixture containing a bifunctional silane represented by formula (3) and a tetrafunctional silane represented by formula (4).  R independently represents hydrogen, an alkyl group having 1 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, an aryl group having 6 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen, or an alkenyl group having 2 to 10 carbons whose arbitrary hydrogen can be replaced by a halogen. R' independently represents a hydrolyzable group.

Thermosetting composition

The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.

Alkali soluble polymer and positive working photosensitive resin composition using the same

Provided are a polymerizing liquid-crystalline compound of formula (1). In formula (1), Qto Qeach independently represent a formula (2), a hydrogen atom, a halogen atom, an alkyl group or the like; at least two of Qto Qare a formula (2) and may differ from each other. In formula (2), A independently represent a 1,4-cyclohexylene group, a 1,4-phenylene group or the like; X independently represents a single bond, an alkylene group or the like; Z represents a single bond, &#x2014;COO&#x2014;, &#x2014;OCO&#x2014; or the like; n indicates an integer of from 0 to 3; p represents any one polymerizing group of formulae (P1) to (P8); W represents a hydrogen atom, a halogen atom, an alkyl group or the like. When Qand Qare both hydrogen atoms and when Qand Qare both formula (2), then p must not be (P8).

Polymerizing binaphthalene derivatives

Provided are a liquid-crystal compound and a liquid-crystal composition containing the compound, of which the advantages are that they show nematic hybrid orientation on a rubbed TAC substrate, they are polymerizable in open air and they readily give a polymer having a high degree of polymerization even when exposed to a relatively small total quantity of light. The films formed by photopolymerizing them keep nematic hybrid orientation. The compound is represented by formula (1): wherein Ris a hydrogen or an alkyl; Ris a hydrogen, &#x2014;OCF, etc.; Ais a 1,4-phenylene, etc.; Aand Aare independently a 1,4-cyclohexylene, a 1,4-phenylene, etc.; Xis a single bond, &#x2014;O&#x2014;, etc.; Xand Xare independently a single bond, &#x2014;COO&#x2014;, &#x2014;C&#x2261;C&#x2014;, &#x2014;CONH&#x2014;, etc.; m is an integer of from 0 to 20; and n is 1 or 0.

Photopolymerizable oxetane derivative and liquid-crystal composition containing it

The compound (1) or (2), a composition containing the compound and a polymer obtained by polymerizing the composition. Ris fluorine, cyano, alkyl, and so forth; Ris hydrogen, alkyl, and so forth; Rand Rare independently hydrogen, fluorine, alkyl, and so forth; A is 1,4-cyclohexylene, 1,4-phenylene, and so forth; X is a single bond, &#x2014;COO&#x2014;, &#x2014;OCO&#x2014;, and so forth; P is alkylene and so forth; m and n are independently 0, 1 or 2.

Fluorene derivatives and polymers thereof

The present invention provides a compound represented by formula (1) defined in the specification. The invention further provides a liquid crystal composition comprising at least two compounds, which at least one compound out of them is the above compound. The invention still further provides a polymer obtained by polymerizing the above composition, and uses of the polymer such as a molded article having an optical anisotropy, an optical compensation element, a wavelength functional plate, an optical element, and a liquid crystal display element comprising the polymer.

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Ichihara, Japan

Tomohiro Etou