Anritsu Infivis Co., Ltd.

Tomohiko Yamaguchi

Yuki Hayakawa

Eiji Taniguchi

Akira Ohashi

A metal detection apparatus comprises: a detection circuit unit () that detects a first variation component having a large influence of workpiece and a second variation component having a large influence of metal; a determination unit () that compares the two variation components to perform a metal determination process in the workpiece (W); and a detection condition adjustment unit () that adjusts detection conditions of both variation components. A foreign matter waveform storage unit () stores a test variation component accompanying temporal change due to metal influence is further provided. The detection condition adjustment unit sets a specific processing condition of detection processing in the detection circuit unit based on the first variation component based on the magnetic field variation signal at the time when the work W including no metal passes through the inspection zone Z and the second variation component constituted by the test variation component.

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Kanagawa, Japan

Tomohiko Yamaguchi