Tokyo Electron Limited

Tomohide Inoue

Kenji Sekiguchi

Keizo Hirose

Kinya Ueno

Takanori Miyazaki

In a cleaning apparatus for substrates, such as semiconductor wafers, a permeable core member made of a synthetic resin is supplied with distilled water from a distilled water supply path within a head portion of a cleaning tool . A planar portion is provided on the lower surface of the core member and a porous resin sheet is attached to the outer surface of the core member , to cover it. The cleaning tool is provided with an air bearing cylinder that imparts a vertical driving force to a rod that presses against the surface of a wafer W which is being rotated, and the distilled water supply path is provided within the rod . The distilled water supplied from the distilled water supply path permeates through the core member and the porous resin sheet and is sent out of the head so that a flowing film of distilled water is formed on the surface of the wafer W. Thus contamination and damage of the substrate is prevented and the shape of the head is not destroyed.

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Kurume, Japan

Tomohide Inoue