Canon Kabushiki Kaisha

Tomoharu Hase

Yukio Yamane

Yoshinori Miwa

An exposing method which can effect the cleaning of an optical element so that throughput may not be substantially reduced when exposure using ultraviolet light is effected. The exposing method applies ultraviolet light emitted from a light source to an object to be exposed through a first isolated chamber including an optical surface, and a second isolated chamber including an optical surface to thereby expose the object to be exposed by the light. The method includes a first cleaning step of supplying a cleaning gas to the first isolated chamber to thereby clean the optical surface included in the first isolated chamber, and a second cleaning step of supplying a cleaning gas to the second isolated chamber to thereby clean the optical surface included in the second isolated chamber, wherein the start of the first cleaning step is later than the start of the second cleaning step.

Exposing method, exposing apparatus and device manufacturing method utilizing them

Disclosed is an illumination system for illuminating a surface to be illuminated, with light from a light source, the illumination system including a first optical integrator having a plurality of lens groups, for forming a plurality of first secondary light sources by use of light from the light source, a second optical integrator for forming a second secondary light source by use of light from the first secondary light sources, a first collecting optical system for superposing light from the first secondary light sources on a light entrance surface of the second optical integrator, a second collecting optical system for superposing light from the second secondary light source on the surface to be illuminated, and a driving mechanism for moving at least one of the plurality of lens groups translationally along a plane perpendicular to an optical axis, whereby the telecentricity of light illuminating the surface to be illuminated can be adjusted.

Illumination system and exposure apparatus

An exposure apparatus for exposing a substrate to a pattern of a mask by use of exposure light. The apparatus includes an optical system for directing the exposure light from a light source to the substrate, the optical system having an optical element, a first casing for accommodating therein an optical surface of the optical element, and a second casing for accommodating therein the optical element and the first casing, a first port provided in the first casing, a second port provided in the second casing, a supplier for supplying an inert gas into the first casing and the second casing, and a supplier for supplying an inert gas into the first casing and the second casing through the first port and the second port.

Exposure apparatus and method of cleaning optical element of the same

An exposure apparatus includes an optical system having a first optical element, for directing light from a light source to a member to be exposed. The first optical element serves to separate first and second spaces inside the optical system, and the first optical element has a first notch formed at an end portion outside an effective light flux of light from the light source.

Exposure apparatus and device manufacturing method

An exposure apparatus includes a light source, which emits an exposure beam, an optical system including a casing and an optical element, the casing having a closed space and the optical element being disposed in the casing, a first supplier, which supplies an inert gas into the closed space, a second supplier, which supplies one of oxygen and clean air into the closed space and a controller, which changes a wavelength of the exposure beam between exposure of a substrate and cleaning of the optical element.

An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, and a gas purging device for replacing an inside space, where optical components of at least one of the illumination optical system and the projection optical system are placed, with a gas containing substantially no water content or an inert gas.

Exposure apparatus and device manufacturing method including gas purging of a space containing optical components

An exposure apparatus including an optical system having a first optical element, for directing light from a light source to a member to be exposed. The first optical element serves to separate first and second spaces inside the optical system, and the first optical element has a first notch formed at an end portion outside an effective light flux of light from the light source.

An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed and a gas purging means for replacing an inside space, which contains optical components of at least one of the illumination optical system and the projection optical system, with a gas having substantially no water content.

An exposure apparatus includes an illumination optical system for illuminating an original with an F excimer laser, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, a gas purging device for replacing a gas in an inside space, which accommodates optical components of at least one of the illumination optical system and the projection optical system, with a dry gas, a hygrometer, disposed in the inside space, for measuring conditions in the inside space and for producing an output, and a controller for controlling the gas purging device on the basis of the output of the hygrometer.

An exposure apparatus for transferring a pattern onto an object. The apparatus includes an optical member constituting part of an optical system arranged between a light source and the object, a rotor having a hole extending in an axial direction thereof, the optical member being mounted in the hole, a stator, the rotor and the stator constituting a motor for rotating the optical member, and a non-contact bearing for supporting the rotor.

Exposure apparatus

An exposure apparatus in which an exposure process is performed by projecting an exposure beam of X-rays or ultraviolet rays from an excimer laser, for example, to a substrate, is provided with an arrangement wherein an inert gas containing a small amount of oxygen is supplied to a closed space where an optical element is disposed, and wherein the exposure beam is projected thereto by which ozone is produced in the closed space. An organic compound deposited on the optical element can be removed by a photochemical reaction through projection of the exposure beam and the produced ozone.

Growing community of inventors

Utsunomiya, Japan

Tomoharu Hase