Toshiba Memory Corporation

Kioxia Corporation

Tomo Hasegawa

Toshiyuki Sasaki

Mitsunari Horiuchi

Kei Watanabe

Mitsuhiro Omura

Keisuke Kikutani

Jun Nishimura

Hideyuki Kinoshita

Kazuhisa Matsuda

Soichi Yamazaki

Kosuke Horibe

Hisashi Harada

A manufacturing method of a semiconductor device includes etching a film using etching gas that has a first or second molecule which has a CFgroup and in which the number of carbon atoms is four or five. Further, the first molecule has an R1 group that bonds to a carbon atom in the CFgroup through a double bond, and the R1 group contains carbon and also chlorine, bromine, iodine, or oxygen. Further, the second molecule has an R2 group that bonds to a carbon atom in the CFgroup through a single bond and an R3 group that bonds to the carbon atom in the CFgroup through a single bond, the R2 group or the R3 group or both containing carbon, and both the R2 group and the R3 group containing hydrogen, fluorine, chlorine, bromine, iodine, or oxygen.

Manufacturing method of semiconductor device and etching gas

A semiconductor device of an embodiment includes a control circuit arranged on a substrate, a first conductive layer arranged on the control circuit and containing a first element as a main component, a multilayer structure arranged on the first conductive layer and configured such that multiple second conductive layers and multiple insulating layers are alternately stacked on each other, a memory layer penetrating the multilayer structure and reaching the first conductive layer at a bottom portion, a first layer arranged between the control circuit and the first conductive layer and containing the first element as a main component, and a second layer arranged between the control circuit and the first layer and containing, as a main component, a second element different from the first element.

Semiconductor device

A method for manufacturing a semiconductor device includes forming a resist film on a film to be processed. An upper portion of the film to be processed is processed using the resist film as a first mask. Tungsten or a tungsten compound is selectively formed on the resist film. A lower portion of the film to be processed is processed with a reducing gas using the tungsten or the tungsten compound as a second mask.

Method for manufacturing semiconductor device

Growing community of inventors

Yokkaichi Mie, Japan

Tomo Hasegawa