Kla Tencor Corporation

Kla-tencor Technologies Corporation

Tom Carr

Steven W Meeks

Harald F Hess

Gustavo A Pinto

Romain Sappey

Dan L Kilmer

Patrick Rodney Lee

Alex Moraru

Franklin Tao

Matt Bellis

Jun Zhu

Teodor Zanetti

In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a scatterometer to identify at least one defect region on the surface and a surface profile height measuring tool to measure one or more characteristics of the surface in the defect region with a surface profile height measuring tool.

Surface characteristic analysis

A system and methods for efficiently performing media writing functions is disclosed. The system and methods include: detecting media movement with respect to a base and heads during reading and writing, and moving the heads in response; using an interferometer, such as a dual beam differential interferometer, to dynamically monitor disk position and address perceived errors; and minimizing repeatable and non repeatable runout error by writing data, such as servo bursts, in multiple revolutions to average adverse runout conditions. The present system has the ability to use an interferometer to enhance media certification and perform on line, in situ monitoring of the media, and includes shrouding, head mounting, disk biasing, and related mechanical aspects beneficial to media writing.

Media servowriting system

Growing community of inventors

Leucadia, CA, United States of America

Tom Carr