Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Asml Netherlands B.v.

Trumpf Lasersystems for Semiconductor Manufacturing Se

Tolga Ergin

Martin Lambert

Derk Jan Wilfred Klunder

Ruud Antonius Catharina Maria Beerens

Frank B Sperling

Andrey Sergeevich Tychkov

Stefan Michael Bruno Bäumer

Stefan Piehler

Oliver Schlosser

Andreas Kristian Hopf

Manisha Ranjan

Thomas Schwarzbaeck

Jasper Witte

Jiayue Yuan

Nico Johannes Antonius Hubertus Boonen

Boris Regaard

Thomas SCHWARZBÄCK

An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.

EUV light source with a beam positioning device

A laser focusing system () for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror () configured to receive a laser beam from a beam delivery system () and generate a first reflected laser beam (); •—a second curved mirror () configured to receive the first reflected laser beam () and generate a second reflected laser beam (), wherein the laser focusing system () is configured to focus the second reflected laser beam () to a target location () in a vessel () of the EUV radiation source ().

Laser focussing module

A focusing device for focusing a laser beam in a target area. The focusing device includes a paraboloid mirror configured to widen the laser beam; an ellipsoid mirror or a hyperboloid mirror configured to focus the widened laser beam at a focal position within the target area; and a movement device. The movement device is configured to move the ellipsoid mirror or the hyperboloid mirror relative to the paraboloid mirror, or together with the paraboloid mirror, to change the focal position within the target area.

Focusing device and EUV radiation generating device having same

A reflective optical element includes a first, inner surface region for reflecting a first inner beam portion of a light beam impinging on the reflective optical element in order to form a first reflected light beam, and at least one second, outer surface region for reflecting at least one second outer beam portion of the impinging light beam for forming at least one second reflected light beam. The second surface region is designed to reduce a beam cross section of the second reflected light beam by comparison to the first reflected light beam such that the second reflected light beam extends along a superposition length completely within the first reflected light beam. In addition a beam guiding device has at least one such reflective optical element and an EUV-beam generating device has such a beam guiding device.

Reflective optical element, beam guiding device and EUV-beam generating device

A polarizer arrangement for polarizing a laser beam includes: multiple plate-shaped optical elements which are arranged in a beam path of the laser beam and each of which includes a beam entry surface for the laser beam and a beam exit surface for the laser beam, in which the beam entry surface of a respective plate-shaped optical element is oriented at the Brewster angle relative to the laser beam. The beam entry surfaces and the beam exit surfaces of the plate-shaped optical elements are in each case oriented at least at one wedge angle relative to one another. An EUV radiation generating device may include such a polarizer arrangement.

Polarizer

Beam guiding devices for guiding a laser beam, in particular in a direction towards a target region for producing extreme ultraviolet (EUV) radiation, include an adjustment device for adjusting a beam diameter and an aperture angle of the laser beam. The adjustment device includes a first mirror having a first curved reflecting surface, a second mirror having a second curved reflecting surface, a third mirror having a third curved reflecting surface, a fourth mirror having a fourth curved reflecting surface, and a movement device configured to adjust the beam diameter and the aperture angle of the laser beam by moving the first reflecting surface and the fourth reflecting surface relative to one another and, independently thereof, moving the second reflecting surface and the third reflecting surface together relative to the first reflecting surface and the fourth reflecting surface.

Adjusting a beam diameter and an aperture angle of a laser beam

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Bietigheim-Bissingen, Germany

Tolga Ergin