Shin-etsu Chemical Co., Ltd.

Matsushita Electric Industrial Co., Ltd.

National Institute of Information and Communications Technology, Incorporated Administrative Agency

Matsushita Electrical Industrial Co., Ltd.

Communications Research Laboratory, Independent Administrative Institution

Tohru Kubota

Mikio Endo

Toshinobu Ishihara

Yoichi Tonomura

Ayumu Kiyomori

Takayuki Honma

Yasufumi Kubota

Kazufumi Ogawa

Katsuhiro Uehara

Masaki Takeuchi

Yasuhisa Tanaka

Akira Yamamoto

Norihisa Mino

Jun Hatakeyama

Daijitsu Harada

Hiroyuki Yamazaki

Masato Kawakami

Shinro Mashiko

Takeshi Kinsho

Koji Hasegawa

Takeru Watanabe

Minoru Takamizawa

Toshio Shinohara

Yoshiyuki Tani

Satoshi Uchida

Hiroyuki Hasegawa

Masayuki Endou

Osamu Watanabe

Yoshio Kawai

Katsuya Takemura

Motoaki Iwabuchi

Shoji Ichinohe

Shigehiro Nagura

Takaaki Shimizu

Jun Watanabe

Takanobu Takeda

Koji Sakuta

Toshio Yamazaki

Muneo Kudo

Kenji Funatsu

Yasuaki Hara

Hiroshi Ohashi

Ikuo Fukui

Kanji Murofushi

Hiroshi Umezawa

Hideki Sugahara

Kazuyuki Asakura

Toshiaki Takahashi

Yusuke Itoh

Shuji Tanaka

Takanobu Tsudera

Katsuyuki Oikawa

Hiromi Nishiwaki

Satoshi Onai

Shotaro Aoki

Takeshi Aoyama

Masayuki Hasegawa

Takashi Nagase

Naoki Yamauchi

Naoki Nagai

A composition is provided comprising (a) a polysilazane having a monovalent hydrocarbon group, (b) untreated metal oxide nanoparticles, metal oxide nanoparticles having a monovalent hydrocarbon group, or metal oxide nanoparticles having an alkylsilyl or alkoxysilyl group, and (c) an aprotic solvent. The composition has storage stability and is suitable for forming a film having water repellent, especially superhydrophobic properties.

Water repellent film-forming composition and water repellent film

The present invention provides a stretchable film that is excellent in stretch and strength and water repellency on the film surface, and a method for forming the stretchable film. The present invention was accomplished by a stretchable film including a resin having a branched siloxane bond having 3 to 11 silicon atoms on a side chain and having a urethane bond on a main chain.

Stretchable film and method for forming the stretchable film

Polycyclic aminosilane compounds of specific structure are fully effective for use as silane coupling agents, surface treating agents, resin additives, paint additives, and adhesives and evolve little or no low-boiling alcohols during service.

Polycyclic aminosilane compounds and making method

An amino-containing organosilicon compound having formula (1) is used for surface treatment of an inorganic filler for thereby rendering the filler more compatible with and adhesive to a polymer material. In formula (1), Ris alkyl, alkenyl, aryl or aralkyl, Ris alkenyl, aryl or aralkyl, Rand Reach are a monovalent hydrocarbon group, and n is 0, 1 or 2. 

Amino-containing organosilicon compound and making method

A composition consisting essentially of 90-99 parts by weight of a nitrogen-containing organoxysilane compound and 1-10 parts by weight of an isomer affords an appropriate cure behavior and is useful as paint additive, adhesive, silane coupling agent, textile treating agent, and surface treating agent.

Composition containing nitrogen-containing organoxysilane compound and method for making the same

An organosilicon compound having diphenylethyl and methoxysilyl groups is more readily hydrolyzable than ethoxysilyl-containing organosilicon compounds and generates no hydrogen chloride on use.

Organosilicon compound having diphenylethyl and methoxysilyl and making method

Novel amino acid-modified silane compounds having a weakly acidic amino group and a weakly basic carboxyl group are useful as a surface treating agent or textile treating agent.

Amino acid-modified silane compounds and making method

A silazane compound useful as synthesis intermediates for paint additives, polymer modifiers, pharmaceuticals and agricultural chemicals is efficiently prepared by reaction of a halosilane compound with an amino-containing compound in a solvent which is the same silazane compound as the target product.

Preparation of silazane compound

A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula: wherein Ris a straight or branched divalent Chydrocarbon group, Ris hydrogen atom or an unsubstituted or substituted Cmonovalent hydrocarbon group, Rand Rare respectively a Cmonovalent hydrocarbon group, and n is 0, 1, or 2 and an aminoalcohol represented by the formula: wherein Ris a straight or branched Cdivalent hydrocarbon group which may contain a heteroatom and Ris hydrogen atom or a straight or branched Cmonovalent hydrocarbon group, and promoting intramolecular transesterification to thereby produce a cyclic aminoorganoxysilane compound represented by the formula: wherein Rto Rand n are as defined above.

Cyclic aminoorganoxysilane compound and its production method

Silyl-protected nitrogen-containing cyclic compounds having formula (1) are provided wherein R, Rand Reach are a monovalent hydrocarbon group, Rand Reach are a divalent hydrocarbon group, R, Rand Reach are H or a monovalent hydrocarbon group. A is &#x2014;C(O)ORor &#x2014;C&#x2261;N, Ris a monovalent hydrocarbon group, and a is 0 or 1. The compounds are added to polyurethane, polyester or polycarbonate resins to form one part type curable compositions for imparting stiffness, mechanical strength and transparency thereto. 

Silyl-protected nitrogen-containing cyclic compounds and making method

The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R&#x2014;S&#x2014;R' (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R&#x2032; is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RSi(OR&#x2032;)(wherein R and R&#x2032; are each an alkyl group having 1 to 20 carbon atoms).

Method for purifying chlorosilanes

A [3-(2-norbornyl)-2-norbornyl]silane compound having formula (1) is novel, wherein Ris a monovalent hydrocarbon radical, X is halogen or an organoxy OR, Ris a monovalent hydrocarbon radical, n is 1 or 2 when X is halogen, and n is 0, 1 or 2 when X is organoxy. It is a useful reactant for forming surface coatings on electronic parts. 

[3-(2-norbornyl)-2-norbornyl]silane compound and making method

The method comprises at least three steps of a hydrogenation step () and/or a chlorination step (), an impurity conversion step (), and a purification step (). In the impurity conversion step (), an aldehyde compound represented by the general formula Ar&#x2014;R&#x2014;CHO (Ar; denotes a substituted or unsubstituted aryl group, R; denotes an organic group having two or more carbon atoms) is added to convert donor impurities and acceptor impurities contained in a chlorosilane distillate to a high-boiling substance. The chlorosilane distillate after the donor impurities and acceptor impurities have been converted to a high-boiling substance is sent to the purification step (). In the purification step (), high purity chlorosilanes from which the donor impurities and acceptor impurities have been thoroughly removed are obtained by using a distillation column or the like, where the high purity chlorosilanes are recovered outside the system from the top of the column.

A nanoimprint-mold release agent including an alkoxysilane compound represented by general formula (1) is provided wherein Rand R' are each independently a fluoroalkyl group of 1 to 10 carbon atoms; Ris a hydrogen atom or an aliphatic monovalent hydrocarbon group of 1 to 6 carbon atoms; Rand Rare each independently methyl group or ethyl group; X and Y are each independently an ether linkage or an ester linkage; a and b are each 0 or 1; m, n, and p are each an integer of 0 to 6; q is an integer of 1 to 6 and r is an integer of 0 to 2.

Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold

A silane compound having a secondary amino group protected with a specific silyl group is useful as silane coupling agent, resin additive, textile treating agent, surface treating agent, paint additive, and adhesive.

Organoxysilane compounds having silyl-protected secondary amino group and making method

Growing community of inventors

Joetsu, Japan

Tohru Kubota