Tosoh Corporation

Tohru Doi

Shinsuke Toyomasu

Takahiro Kitagawa

Shinji Shimosato

Kota Sakaguchi

Masayasu Ito

Yasuyoshi Fujii

Kenichi Makita

Takashi Fukuda

Akira Inui

To provide a novel fumaric acid diester-cinnamic acid ester-based copolymer having a high molecular weight, which is expected to maintain excellent strength or ensures excellent toughness even when formed into a film, a method for efficiently producing the copolymer, and a film using the same. The fumaric acid diester-cinnamic acid ester-based copolymer contains a fumaric acid diester residue unit, a cinnamic acid ester residue unit having an alkyl group with a carbon number of 1 to 6, and a residue unit of a polyfunctional monomer having two or more radical polymerizable functional groups.

Fumaric acid diester-cinnamic acid ester-based copolymer, production method thereof and film using the same

A resin composition containing a specific cellulose-based resin and a specific fumaric acid diester polymer in a specific blending ratio or containing, as the resin component, a specific cellulose-based resin and a specific fumaric acid diester polymer in a specific blending ratio and containing the resin component and an additive having an aromatic hydrocarbon ring or the like in a specific blending ratio. An optical compensation film can be produced using the resin composition.

Resin composition, optical compensation film using the same and production method of optical compensation film

A fumaric acid diester based resin containing a dipropyl fumarate residue unit and a fumaric acid diester residue unit having a C1 or C2 alkyl group, wherein in a retardation film composed of the resin, when a refractive index in the fast axis direction within the film plane is designated as nx, a refractive index in the film in-plane direction orthogonal thereto is designated as ny, and a refractive index in the thickness direction of the film is designated as nz, the respective refractive indices are satisfied with a relationship of (nx&#x2266;ny&#x3c;nz) and a relationship between a film thickness and an out-of-plane retardation measured at a wavelength of 550 nm and expressed by the specific equation is 4.5 nm/film thickness (&#x3bc;m) or more in terms of an absolute value.

Fumaric acid diester based resin for retardation film and retardation film comprising the same

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Mie, Japan

Tohru Doi