Sharp Display Technology Corporation

Tohru Daitoh

Yoshihito Hara

Kengo Hara

Jun Nishimura

Yohei Takeuchi

Hajime Imai

Masaki Maeda

Yoshiharu Hirata

Tatsuya Kawasaki

Teruyuki Ueda

Tetsuo Kikuchi

Hitoshi Takahata

Masahiko Suzuki

Setsuji Nishimiya

Hideki Kitagawa

Masamitsu Yamanaka

Masafumi Sugino

An active matrix substrate includes: a first oxide semiconductor layer including a first channel region; a first gate electrode disposed on the substrate side of the first oxide semiconductor layer; a channel protection layer disposed on a side of the first oxide semiconductor layer opposite to the substrate and covering the first channel region; a first TFT having a first source electrode and a first drain electrode in an upper layer of the channel protection layer; a second oxide semiconductor layer; a second gate electrode disposed on a side of the second oxide semiconductor layer opposite to the substrate; and the second TFT having a second source electrode and a second drain electrode disposed on an interlayer insulating layer that covers the second gate electrode, wherein the first oxide semiconductor layer and the second oxide semiconductor layer are formed of the same layered oxide semiconductor film, the layered oxide semiconductor film has a layered structure including a high mobility oxide semiconductor film and a low mobility oxide semiconductor film disposed on the substrate side of the high mobility oxide semiconductor film and having a lower mobility than a mobility of the high mobility oxide semiconductor film, and the channel protection layer of the first TFT and the gate insulating layer of the second TFT are formed of the same insulating film.

Active matrix substrate and method for manufacturing same

The active matrix substrate includes a plurality of oxide semiconductor TFTs supported by a substrate. Each of the plurality of oxide semiconductor TFTs includes an oxide semiconductor layer including a channel region, a lower electrode positioned between the oxide semiconductor layer and the substrate, and an insulating layer positioned between the oxide semiconductor layer and the lower electrode. The insulating layer has a layered structure including a lower layer, an upper layer positioned between the lower layer and the oxide semiconductor layer, and an intermediate layer positioned between the lower layer and the upper layer. The upper layer is a silicon oxide layer, the intermediate layer contains at least silicon and nitrogen, and the lower layer contains at least silicon, nitrogen, and oxygen. A hydrogen desorption amount in the lower layer is larger than a hydrogen desorption amount in the intermediate layer.

Active matrix substrate and manufacturing method thereof

An active matrix substrate includes a pixel TFT including an oxide semiconductor layer, a gate insulating layer provided on the oxide semiconductor layer, and a gate electrode disposed so as to face the oxide semiconductor layer with the gate insulating layer interposed therebetween, a plurality of gate lines, an interlayer insulating layer provided so as to cover the gate electrode and the plurality of gate lines, a plurality of source lines provided on the interlayer insulating layer, an upper insulating layer provided so as to cover the plurality of source lines, and an organic insulating layer provided on the upper insulating layer. The interlayer insulating layer includes a first layer formed of silicon oxide, a second layer provided on the first layer and formed of silicon nitride, and a third layer provided on the second layer and formed of silicon oxide.

Active matrix substrate and display device

In each of unit circuits that constitute a shift register, a first conduction terminal of a second thin-film transistor that controls the output of an output signal serving as a scanning signal is given a second input clock signal having a amplitude larger than the amplitude of a first input clock signal that is given to a first conduction terminal of a first thin-film transistor that controls the output of an output signal serving as a control signal for controlling another unit circuit. The channel length of the second thin-film transistor is set to be greater than the channel length of the first thin-film transistor, so that the breakdown voltage of the second thin-film transistor is higher than the breakdown voltage of the first thin-film transistor.

Scanning signal line drive circuit and display device

Each first thin film transistor of a semiconductor device includes: a lower electrode; a first oxide semiconductor layer including a channel region and first and second contact regions; a gate electrode disposed on the channel region with a gate insulating layer interposed therebetween; and a source electrode and a drain electrode connected to the first contact region and the second contact region, respectively. When viewed from a normal direction of the substrate, at least a part of the channel region overlaps the lower electrode, and at least one of the first and second contact regions is located outside the lower electrode. The channel region has a layered structure including a lower layer, an upper layer located between the lower layer and the gate insulating layer, and a high mobility layer disposed between the lower layer and the upper layer and having mobility higher than mobility of the lower layer and the upper layer. In the channel region, the thickness of the upper layer is equal to or less than 1/3 of the thickness of the lower layer, and the thickness of the high mobility layer is equal to or less than 1/2 of the thickness of the lower layer.

Semiconductor device

A transistor includes a first electrode, a first semiconductor portion that is at least partly superimposed on the first electrode and that is composed of a semiconductor material, a first insulating film that is interposed between the first electrode and the first semiconductor portion, a second electrode that is superimposed on a part of the first semiconductor portion and that is connected to the first semiconductor portion, and a third electrode that is located in a layer in which the second electrode is located, that is superimposed on a part of the first semiconductor portion, and that is connected to the first semiconductor portion. An electric potential of the second electrode is lower than that of the third electrode. The third electrode includes a first portion that is spaced from the second electrode and a second portion that is spaced from the second electrode opposite the first portion.

Transistor, circuit substrate, and display device

An active matrix substrate includes a plurality of thin film transistors including an oxide semiconductor layer, an interlayer insulating layer, a plurality of pixel electrodes arranged above the interlayer insulating layer, a common electrode arranged between the pixel electrode and the interlayer insulating layer and also configured to function as a touch sensor electrode, a first dielectric layer arranged between the interlayer insulating layer and the common electrode, a second dielectric layer arranged between the common electrode and the pixel electrode, a plurality of touch wiring lines arranged between the interlayer insulating layer and the common electrode and formed of a third conductive film, and a plurality of pixel contact portions, in which each of the plurality of pixel contact portions includes a drain electrode of the thin film transistor, a connection electrode formed of the third conductive film and electrically connected to the drain electrode in a lower opening formed in the interlayer insulating layer, and a pixel electrode electrically connected to the connection electrode in an upper opening formed in the first dielectric layer and the second dielectric layer.

Active matrix substrate, method for manufacturing active matrix substrate, and liquid crystal display device with touch sensor using active matrix substrate

An active matrix substrate includes a thin film transistor including an oxide semiconductor layer, an interlayer insulating layer covering the thin film transistor, a pixel electrode provided above the interlayer insulating layer and electrically connected to the thin film transistor, a common electrode provided between the pixel electrode and the interlayer insulating layer, a first dielectric layer provided between the common electrode and the pixel electrode, and an alignment film covering the pixel electrode. The first dielectric layer includes a plurality of openings each of which exposes a part of the common electrode and includes the alignment film positioned therein.

Active matrix substrate and liquid crystal display device

An active matrix substrate includes a pixel TFT provided corresponding to each pixel region, a pixel electrode electrically connected to the pixel TFT, a plurality of gate wirings extending in a row direction, and a plurality of source wirings extending in a column direction. Each gate wiring has a multilayer structure including a lower gate wiring electrically connected to a lower gate electrode included in the pixel TFT and an upper gate wiring electrically connected to an upper gate electrode included in the pixel TFT. In a case where the number of the gate wirings is defined as m and the number of the source wirings is defined as n, each gate wiring has 3 or more and less than n contact portions, each contact portion is positioned in any of n intersection regions, and the number of the contact portions overlapping each source wiring is less than m.

A set circuit in a unit circuit in a gate driver of a display device includes a setting transistor, a first auxiliary transistor, and a second auxiliary transistor. The setting transistor includes a source terminal connected to an internal node, a gate terminal connected to a set input terminal, and a drain terminal connected to the set input terminal via the first auxiliary transistor and also connected to an input terminal via the second auxiliary transistor in a diode-connected form. Each transistor is controlled to be in an on state and an off state during normal drive and is controlled to be in the off state and the on state during a pause period by a control signal supplied to the input terminal.

Scanning signal line drive circuit and display device provided with same

An active matrix substrate includes pixel regions each including a pixel electrode and an oxide semiconductor TFT including an oxide semiconductor layer. Each pixel electrode is electrically connected to one of adjacent two of source bus lines. The oxide semiconductor layer in the oxide semiconductor TFT of each pixel region overlaps the pixel electrode of a first adjacent pixel region. The pixel electrode of the each pixel region partially overlaps the oxide semiconductor layer in a second adjacent pixel region. The source bus lines include first and second source bus lines adjacent to each other. Pixels sets each including two pixel regions whose pixel electrodes are connected to the first source bus line and pixel sets each including two pixel regions whose pixel electrodes are connected to the second source bus line are arranged alternately between the first and second source bus lines.

A shift register includes stages each constituted by a unit circuit provided with a thin-film transistor (separation transistor) that separates a control node into an output-side first control node and an input-side second control node and a capacitor whose first end is connected to the second control node. The thin-film transistor (separation transistor) has a control terminal that is supplied with a high-level DC power supply voltage. Typically, the channel width of a thin-film transistor (first output control transistor) that controls output from a unit circuit is ten or more times greater than the channel width of the thin-film transistor (separation transistor).

Shift register, scanning signal line driving circuit including same, and display device including same

An active matrix substrate includes a gate driver including a shift register including a plurality of unit circuits connected in multiple stages. Each of the plurality of unit circuits includes an output node, a first node, a first TFT including a first gate terminal supplied with the set signal, a first source terminal connected to the first node, and a first drain terminal supplied with a first power supply potential higher than a low-level potential of the set signal, and a second TFT including a second gate terminal connected to the first node, a second source terminal connected to the output node, and a second drain terminal supplied with the clock signal. The first TFT includes a semiconductor layer, and a first and a second gate electrodes disposed on a side of the semiconductor layer opposite to the substrate and connected to the first gate terminal. The semiconductor layer includes a source contact region electrically connected to the first source terminal, a drain contact region electrically connected to the first drain terminal, and a first and a second channel regions separated from each other in a channel length direction between the contact regions when viewed from a normal direction of the substrate. The first gate electrode overlaps the first channel region via an upper gate insulating layer, and the second gate electrode overlaps the second channel region via the upper gate insulating layer.

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Kameyama, Japan

Tohru Daitoh