Asml Holding N.v.

Asml Netherlands B.v.

Todd R Downey

Tian Gang

Janardan Nath

Duan-Fu Stephen Hsu

Peter Conrad Kochersperger

Joseph Harry Lyons

Hendrikus Robertus Marie Van Greevenbroek

Christopher John Mason

Richard Carl Zimmerman

Frederick Kubick

Elizabeth Stone

Kalyan Kumar Mankala

Szilard Istvan Csiszar

Ozer Unluhisarcikli

Olga Vladimirsky

Nicholas Stephen Apone

Alexander Harris Ledbetter

A method for source mask optimization or mask only optimization used to image a pattern onto a substrate. The method includes determining a non-uniform illumination intensity profile for illumination; and determining one or more adjustments for the pattern based on the non-uniform illumination intensity profile until a determination that features patterned onto a substrate substantially match a target design. The non-uniform illumination intensity profile may be determined based on an illumination optical system and projection optics of a lithographic apparatus. In some embodiments, the lithographic apparatus includes a slit, and the non-uniform illumination profile is a through slit non-uniform illumination intensity profile. Determining the one or more adjustments for the pattern may include performing optical proximity correction, for example.

Optimization using a non-uniform illumination intensity profile

An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

Lithographic apparatus and illumination uniformity correction system

A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.

Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

Angular deviation of illumination beam is measured with high accuracy for an expanded continuous range of angles using grating sensors that are configured to exhibit Surface Plasmon Resonance effects at actinic wavelengths. The beam deviation measurement systems and procedures are applicable to both mask-based and maskless lithography tools. A control system adopts an appropriate calibration algorithm based on whether the SPR effect is detected or not. Relative intensity shift in an SPR-affected diffractive order, and/or relative position and slope change in non-SPR-affected diffractive orders are used as a basis of the adopted calibration algorithm.

Systems and methods for lithographic illuminator beam deviation measurement and calibration using grating sensors

A system for measuring an index of refraction that has a light emitting diode and a plurality of reference fibers not in contact with a sample to be measured and that receive light from the light emitting diode. A plurality of sensing fibers with different-shaped plasmon sensors are in contact with the sample and receive light from the light emitting diode. Detectors sense an output of the light from the fibers. The sensing fibers can be arrayed in a planar arrangement, or in a bundle. A cylindrical lens can be used for directing light into the fibers. A plurality of light emitting diodes can be used, each directing its light output into a corresponding fiber. A ball lens can be used for directing the light into the reference fiber. A plurality of wavelength filters can be placed between the light emitting diode and the sensing fiber, and a wavelength of the light entering the fiber may be selected using the filters.

Refractive index sensor utilizing gold island surface plasmon resonance on optical fiber

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Monroe, CT, United States of America

Todd R Downey