Lam Research Corporation

Todd Anthony Lopes

Richard Howard Gould

Travis R Taylor

Derek Witkowicki

Brandon L Senn

Scott Vernon Wong

Peter R Wassei

Adam Patrick Bateman

Silvia Aguilar

Silvia Rocio Aguilar Amaya

Sankaranarayanan Ravi

James Donald Keller

Steven Edmund Pracko

A chamber is formed to enclose a processing region. A passageway is configured to provide for entry of a substrate into the processing region and removal of the substrate from the processing region. A substrate support structure is disposed within the processing region and configured to support the substrate within the processing region. At least one gas input is configured to supply one or more gases to the processing region. At least one gas output is configured to exhaust gases from the processing region. A humidity control device is configured to control a relative humidity within the processing region. At least one heating device is disposed to provide temperature control of the substrate within the processing region. The processing region of the chamber is directly accessible from a substrate handling module configured to operate at atmospheric pressure.

Halogen removal module and associated systems and methods

Disclosed are methods and apparatuses for recirculating gas in an equipment front end module ('EFEM'), including the ability to provide a gas during recirculation and control the gas flow, pressure, and composition of the environment in the EFEM during recirculation.

Equipment front end module gas recirculation

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Livermore, CA, United States of America

Todd Anthony Lopes