Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Tobias Zickenrott

Michael Vergöhl

Andreas Pflug

Stefan Bruns

Daniel Rademacher

André Kaiser

Thomas Melzig

Michael VERGÖHL

The invention relates to a method for producing layers with very good uniformity in coating systems with horizontally rotating substrate guiding. Alternatively, certain layer thickness gradients can be set. The particle loading is also significantly reduced. The service life is much higher compared to other methods. Parasitic coatings are reduced. The coating rate is also increased.

Method for producing layers with improved uniformity in coating systems with horizontally rotating substrate guiding

According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.

Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering

The invention relates to a device and a method for producing layers whose layer thickness distribution can be adjusted in coating systems with horizontally rotating substrate. A very homogeneous or a specific non-homogeneous distribution can be adjusted. The particle loading is also significantly reduced. The service life is significantly higher compared to other methods. Forming of parasitic coatings is reduced.

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

The invention relates to the deposition of optical precision films with high uniformity, precision, particle freedom and low absorption on the substrate. For this purpose, a method and a device are proposed. The approach is the use of target materials and also possibly of surfaces in the sputtering field. Particularly high uniformity and also particularly low residual absorption are achieved with these materials. The invention is suitable for the production of optical thin-film filters, as are used for example in laser material machining, laser components, optical sensors for measuring technology, or in medical diagnostics.

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Braunschweig, Germany

Tobias Zickenrott