Heraeus Quarzglas Gmbh & Co Kg

Tobias Pogge

Martin Trommer

Waltraud Werdecker

Bodo Kuehn

Jürgen Weber

Juergen Weber

Ulrich Kirst

An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250&#xb0; C. and its viscosity is at least 10dPa&#xb7;s at a temperature of 1200&#xb0; C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiOraw material to obtain a quartz glass blank, the SiOraw material or the quartz glass blank being subjected to a dehydration measure, heating the SiOraw material or the quartz glass blank to a nitriding temperature in the range between 1050&#xb0; C. and 1850&#xb0; C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250&#xb0; C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

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Muehlheim, Germany

Tobias Pogge