Lam Research Corporation

Other

Timothy Scott Thomas

Karl Frederick Leeser

Patrick G Breiling

Sean M Donnelly

Damien Martin Slevin

David William Kamp

Michael John Selep

Bin Luo

David Michael French

Vincent Burkhart

Joel Philip Hollingsworth

Ramesh Chandrasekharan

Jeffrey M Simpson

Vince Burkhart

Troy Alan Gomm

Terrence George Bernier

Allan Matthew Jones

Kevin Curbo

Jose (Joey) M DeLaRosa, Ii

Dave Kamp

Matthew B Schick

Showerheads for semiconductor processing equipment are disclosed that include various features designed to promote thermal control of the showerhead in high-temperature applications.

Thermally controlled chandelier showerhead

A thermal choke rod connecting a radio frequency source to a substrate support of a plasma processing system includes a tubular member having a first connector for connecting to an RF rod coupled to the substrate support and a second connector for connecting to an RF strap that couples to the RF source. A tubular segment extends between the first and second connectors. The first connector has a conically-shaped end region that tapers away from the inner surface thereof to an outer surface in a direction toward the tubular segment, and slits that extend for a prescribed distance from a terminal end of the first connector. The outer surface of the tubular segment has a threaded region for threaded engagement with an annular cap that fits over the first connector and reduces an inner diameter of the first connector upon contact with the conically-shaped end region of the first connector.

High temperature RF connection with integral thermal choke

A faceplate of a showerhead has a bottom side that faces a plasma generation region and a top side that faces a plenum into which a process gas is supplied during operation of a substrate processing system. The faceplate includes apertures formed through the bottom side and openings formed through the top side. Each of the apertures is formed to extend through a portion of an overall thickness of the faceplate to intersect with at least one of the openings to form a corresponding flow path for process gas through the faceplate. Each of the apertures has a cross-section that has a hollow cathode discharge suppression dimension in at least one direction. Each of the openings has a cross-section that has a smallest cross-sectional dimension that is greater than the hollow cathode discharge suppression dimension.

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

A tool for driving a component with a knurling pattern around an outer surface of the component is provided. A shaft, with a first end, is in the form of at least a partial cylinder, where the at least partial cylinder has a first inner diameter that is less than an outer diameter of the knurling pattern. Serrations in the shaft have a pattern that matches the knurling pattern, which allow the serration in the shaft to engage with the knurling pattern so that when the shaft is rotated, the component is rotated.

Knurling edge driving tool

An electrostatic substrate chuck with substrate backside purging to prevent incidental backside deposition and that provides thermal sinking to prevent or mitigate the failure of seals.

Electrostatic chucking pedestal with substrate backside purging and thermal sinking

A showerhead tilt adjustment mechanism is provided which supports a showerhead module in a top plate of a semiconductor substrate processing apparatus, the showerhead tilt adjustment mechanism including a differential screw which provides coarse and fine adjustments to adjust gap/tilt/planarization of a faceplate of the showerhead module with respect to an upper surface of a substrate pedestal module adjacent the faceplate in the semiconductor substrate processing apparatus.

Showerhead tilt mechanism

A deposition apparatus for processing substrates includes a vacuum chamber including a processing zone in which a substrate may be processed. First and second gas sources are in fluid communication with the vacuum chamber. The first gas source is operable to supply a first gas into the vacuum chamber and the second gas source is operable to supply a second gas into the vacuum chamber. A showerhead assembly includes a face plate and back plate. The back plate includes a first gas inlet in fluid communication with the first gas source and a second gas inlet in fluid communication with the second gas source. The face plate includes a lower wall and an outer wall extending vertically upwardly from an outer periphery of the lower wall. The outer wall is sealed to an outer periphery of the back plate such that an inner plenum and an edge plenum are formed between the face plate and the back plate. The face plate includes a first gas permeable region in fluid communication with the first gas inlet via the inner plenum such that the first gas may be supplied therethrough during processing and a second gas permeable region in fluid communication with the second gas inlet via the edge plenum such that a second gas may be supplied therethrough during processing. A substrate pedestal assembly is configured to support a substrate on an upper surface thereof when a substrate is processed in the deposition apparatus.

Deposition apparatus including edge plenum showerhead assembly

A semiconductor substrate processing apparatus comprises a vacuum chamber in which a semiconductor substrate may be processed, a showerhead module through which process gas from a process gas source is supplied to a processing zone of the vacuum chamber, and a substrate pedestal module. The substrate pedestal module includes a platen, a stem having a side wall defining a cylindrical interior region thereof, a lower surface, and an upper end that supports the platen, and an adapter having a side wall defining a cylindrical interior region thereof and an upper surface that supports the stem. The lower surface of the stem includes a gas inlet in fluid communication with a respective gas passage located in the side wall of the stem and a gas outlet located in an annular gas channel in the upper surface of the adapter. The upper surface of the adapter includes an inner groove located radially inward of the gas outlet and an outer groove located radially outward of the inner groove. The inner groove and the outer groove have respective O-rings therein so as to form a vacuum seals during processing. The platen includes at least one platen gas passage in fluid communication with a respective gas passage in the side wall of the stem through which backside gas can be supplied to a region below a semiconductor substrate when supported on the upper surface of the platen during processing.

High temperature substrate pedestal module and components thereof

An apparatus for removing and storing outer wheel assemblies from combines being transported on public roads is disclosed. The apparatus includes a pivoting dual-boom crane temporarily mounted to an attachment frame of a combine. The crane swings over either outside wheel assembly and provides a lifting support for installing or removing the wheel assembly. A dual-boom crane includes a wheel bar configured to grip and lift a wheel assembly. The wheel assemblies are then secured on the apparatus such that the combine can be transported over public roadways without exceeding a typical width limit.

Wheel installation crane for combines

The present invention discloses a tank trailer for transporting flowable material. The tank trailer includes a low-profile tank having a rear section, a front section, and a transitional section. The transitional section connects the rear section and the front section such that flowable material can flow among the sections. The rear section has a rear circumference and a rear center of gravity. The front section has a front circumference and a front center of gravity. The front circumference is smaller than the rear circumference, and the rear center of gravity is lower than the front center of gravity. The sections have tops that are collinearly aligned. The front section and the transitional section are frameless underneath. The tank trailer also includes a trailer suspension operatively connected to the rear section.

Low-profile vacuum tank trailer for transporting flowable material

The present invention discloses a tank trailer for transporting flowable material. The tank trailer includes a low-profile tank having a rear section, a front section, and a transitional section. The transitional section connects the rear section and the front section such that flowable material can flow among the sections. The rear section has a rear circumference and a rear center of gravity. The front section has a front circumference and a front center of gravity. The front circumference is smaller than the rear circumference, and the rear center of gravity is lower than the front center of gravity. The front section and the transitional section are frameless. The tank trailer also includes a trailer suspension operatively connected to the rear section.

Growing community of inventors

Wilsonville, OR, United States of America

Timothy Scott Thomas