Semitool, Inc.

Key Technology Corporation

Other

Timothy J Reardon

Eric J Bergman

Raymon F Thompson

Aleksander Owczarz

Thomas H Oberlitner

Craig P Meuchel

Martin C Bleck

James Dale Ruff

Mike Lemke

Philip L Hoffman

Ken McGarvey

Peter T Jones

Rodney J Fazzari

Hans G Haimberger

Russel A Hill

Hans G Halmberger

The present invention is an apparatus and method for sorting foreign material and undesirable articles from a product stream. A mechanical diverter having a concave shape is responsive to an inspection station coupled to the product stream. The mechanical diverter is employed to effectively launch or otherwise redirect undesirable articles in an alternate path. In addition, an air ejector in one form of the invention is provided and is responsive to the inspection station and is employed to dislodge foreign material from the product stream.

Sorting apparatus and method utilizing a mechanical diverter

A quality regulating apparatus and method is disclosed which operates on a product stream having an incoming product stream quality level so that an outgoing product stream quality level provided by the apparatus follows a target quality level so that it is better than the target quality level providing a maximum yield. The apparatus includes a conveying device, a product stream imager, an inspection engine, a routing engine, and an object diverting station. In operation, the inspection engine and routing engine cooperate in a manner so that objects classified as defective are intentionally passed to the output product stream when their inclusion maintains the quality level of the first output product stream at a level that is better than or equal to the target quality level.

Quality regulating apparatus and method

The present invention is an apparatus and method for sorting foreign material and undesirable articles from a product stream. A mechanical diverter having a concave shape is responsive to an inspection station coupled to the product stream. The mechanical diverter is employed to effectively launch or otherwise redirect undesirable articles in an alternate path. In addition, an air ejector is responsive to the inspection station and is employed to dislodge foreign material from the product stream.

A semiconductor processor for spray coating wafers or other semiconductor articles. The processor has a compartment in which are mounted a wafer transfer, coating station and thermal treatment station. The coating station has a spray processing vessel in which a movable spray-head and rotatable wafer holder. The spray station has coating viscosity control features. An ultrasonic resonating spray-head is precisely supplied with coating from a metering pump. The heat treatment station heat cures the coating and then cools the wafer. The system allows coatings to be applied in relatively uniform conformational layers upon irregular surfaces.

Semiconductor processing apparatus

A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.

Semiconductor processor with wafer face protection

Semiconductor processing spray coating apparatus

A wafer processor including a wafer support for holding semiconductor wafers. The wafer support member includes wafer gripping fingers mounted in receptacles formed through a wafer support plate. The fingers are angularly displaced to spread the fingers and allow loading of wafers therebetween. The fingers have central cores which are flexibly mounted within a mounting flange by a thin diaphragm. A pivot control supports the cores and carries axial loading. The pivot control members preferably are U-shaped and can serve as connections to an actuator. A locking mechanism is also shown to secure the actuator connection.

Semiconductor processor wafer holder

Disclosed are apparatuses and methods for improved processing of semiconductor wafers and the like using vapor phase processing chemicals, particularly aqueous hydrofluoric acid etchants. Homogeneous vapor mixtures are generated from homogeneous liquid mixtures. Means for recirculating, mixing and agitating the liquid phase reactants are provided. In some embodiments the liquid phase is advantageously circulated through a chemical trench within the processing bowl. Exposure of wafers to vapors from the chemical trench can be controlled by a vapor control valve which is advantageously the bottom of the processing chamber. The wafer is rotated or otherwise moved within the processing chamber to provide uniform dispersion of the homogeneous reactant vapors across the wafer surface and to facilitate vapor circulation to the processed surface. A radiative volatilization processor can be utilized to volatilize reaction by-products which form under some conditions. The apparatuses provide efficient uniform etching with low particle count performance.

Multi-station semiconductor processor with volatilization

Gas phase semiconductor processor with liquid phase mixing

Disclosed are apparatuses and methods for improved processing of semiconductor wafers and the using vapor phase processing chemicals, particularly aqueous hydrofluoric acid etchants. Homogeneous vapor mixtures are generated from homogeneous liquid mixtures. Means for recirculating, mixing and agitating the liquid phase reactants are provided. In some embodiments the liquid phase is advantageously circulated through a chemical trench within the processing bowl. Exposure of wafers to vapors from the chemical trench can be controlled by a vapor control valve which is advantageously the bottom of the processing chamber. The wafer is rotated or otherwise moved within the processing chamber to provide uniform dispersion of the homogeneous reactant vapors across the wafer surface and to facilitate vapor circulation to the processed surface. A radiative volatilization processor can be utilized to volatilize reaction by-products which form under some conditions. The apparatuses provide efficient uniform etching with low particle count performance.

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Kalispell, MT, United States of America

Timothy J Reardon