Motorola Corporation

Freescale Semiconductor,inc.

Timothy B Dean

Gregory Joseph Dunn

Remy J Chelini

William H Lytle

Claudia Gamboa

Daniel T Rooney

Owen R Fay

Jovica Savic

Robert T Croswell

Terance B Blake

Jeffrey M Petsinger

Bruce C Deemer

Remy J Chilini

George A Strumberger

A process for reforming a plastic packaged integrated circuit die () includes grinding away () a bottom side () of a plastic package () and portions of a set of leads () that are in the plane of the grinding until a bottom surface () of an inner portion () of the set of leads is exposed at a peripheral region () of the inner portion, cutting () approximately perpendicularly to the top and bottom sides to remove portions of the plastic package and the set of leads that are outside the inner portion of the set of leads, and adapting () the bottom surfaces of the inner portion of the set of leads for reliable electrical connections.

Process to reform a plastic packaged integrated circuit die

An overmolded electronic assembly () is fabricated from one or more overmoldable interface components () that may be electrical contacts or electronic components that have physical interfaces, such as speakers or sensors. The overmoldable interface components have a sacrificial end that is cut off from the remainder of the overmoldable interface components after being overmolded in an electronic assembly, providing a sealed cavity into the overmolded electronic assembly.

Overmolded electronic assembly and overmoldable interface component

In one embodiment, a peelable circuit board foil () has a metal support layer () and a conductive metal foil layer () bonded by an inorganic high temperature release structure () that comprises a co-deposited layer () and a metal oxide layer (). The co-deposited layer comprises an admixture of nickel and one or more of boron, phosphorus, and chromium. In a second embodiment, the peelable printed circuit foil () has a crystallized dielectric oxide layer () disposed on the metal foil layer and an electrode layer () disposed on the crystallized dielectric oxide layer, forming a dielectric peelable circuit board foil () that may be adhered to a layer of a flexible or rigid circuit board, after which the metal support layer can be peeled away, leaving a capacitive structure including the metal foil layer, the crystallized dielectric oxide layer, and the electrode layer.

Peelable circuit board foil

A dielectric circuit board foil () includes a conductive metal foil layer (), a crystallized dielectric oxide layer () disposed adjacent a first surface of the conductive metal foil layer, a lanthanum nickelate layer () disposed on the crystallized dielectric oxide layer, and an electrode layer () that is substantially made of one or more base metals disposed on the lanthanum nickelate layer. The foil () may be adhered to a printed circuit board sub-structure () and used to economically fabricate a plurality of embedded capacitors, including isolated capacitors of large capacitive density (&#x3e;1000 pf/mm).

Printed circuit dielectric foil and embedded capacitors

The invention provides an integrated device with corrosion-resistant capped copper bond pads. The capped copper bond pads include at least one copper bond pad on a semiconductor substrate. An activation layer comprising one of immersion palladium, electroless cobalt, or immersion ruthernium is disposed on the copper bond pad. A first intermediate layer of electroless nickel-boron alloy is disposed on the activation layer. A second intermediate layer comprising one of electroless nickel or electroless palladium is disposed on the first intermediate layer, and an immersion gold layer is disposed on the second intermediate layer. A capped copper bond pad and a method of forming the capped copper bond pads are also disclosed.

Corrosion-resistant copper bond pad and integrated device

The invention provides a method of plating an integrated circuit. An activation plate is positioned adjacent to at least one integrated circuit. The integrated circuit includes a plurality of bond pads comprising a bond-pad metal, and the activation plate also comprises the bond-pad metal. A layer of electroless nickel is plated on the bond pads and the activation plate, and a layer of gold is plated over the layer of electroless nickel on the bond pads and the activation plate. An integrated circuit with bond pads plated using the activation plate, and a system for plating an integrated circuit is also disclosed.

Activation plate for electroless and immersion plating of integrated circuits

In one embodiment, a peelable circuit board foil () has a metal support layer () and a conductive metal foil layer () bonded by an inorganic release material (). The conductive metal foil layer has a an exposed surface () that is coated with a high temperature anti-oxidant barrier () and has a roughness less than 0.05 microns RMS. In a second embodiment, the peelable printed circuit foil () has a crystallized dielectric oxide layer () disposed on the exposed surface of the conductive metal foil layer and an electrode layer () disposed on the crystallized dielectric oxide layer, forming a dielectric peelable circuit board foil () that may be adhered to a layer of a flexible or rigid circuit board, after which the metal support layer can be peeled away, leaving a capacitive structure including the metal foil layer, the crystallized dielectric oxide layer, and the electrode layer.

Growing community of inventors

Elk Grove Village, IL, United States of America

Timothy B Dean