Asml Netherlands B.v.

Timotheus Franciscus Sengers

Sjoerd Nicolaas Lambertus Donders

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Jeroen Johannes Sophia Maria Mertens

Christiaan Alexander Hoogendam

Bob Streefkerk

Joeri Lof

Alexander Straaijer

Hans Butler

Klaus Simon

Joannes Theodoor De Smit

Hendricus Johannes Maria Meijer

Helmar Van Santen

Roelof Aeilko Siebrand Ritsema

Frank Van Schaik

Marcus Adrianus Van De Kerkhof

Aleksey Yurievich Kolesnychenko

Hans Jansen

Mark Kroon

Erik Theodorus Maria Bijlaart

Arjen Boogaard

Arie Jeffrey Den Boef

Joost Jeroen Ottens

Kees Van Weert

Johannes Jacobus Matheus Baselmans

Marcel Mathijs Theodore Marie Dierichs

Sergei Shulepov

Richard Joseph Bruls

Herman Boom

Ronald Walther Jeanne Severijns

Antonius Theodorus Anna Maria Derksen

Heine Melle Mulder

Haico Victor Kok

Bearrach Moest

Borgert Kruizinga

Carolus Ida Maria Antonius Spee

Laurentius Catrinus Jorritsma

Wilhelmus Sebastianus Marcus Maria Ketelaars

Marc Antonius Maria Haast

Torsten Harzendorf

Arno Jan Bleeker

Jan Bernard Plechelmus Van Schoot

Jacobus Johannus Leonardus Hendricus Verspay

Oscar Franciscus Jozephus Noordman

Mark Trentelman

Peter Werner Weissbrodt

Gerrit Streutker

Manfred Schrenk

Franciscus Johannes Joseph Janssen

Marcel Beckers

Tjarko Adriaan Rudolf Van Empel

Wilhelmus Josephus Box

Antonius Johannes Josephus Van Dijsseldonk

Leon Martin Levasier

Wilhelmus Petrus De Boeij

Maurice Willem Jozef Etiënne Wijckmans

Reiner Maria Jungblut

Anthonie Kuijper

Marcel Johannus Elisabeth Hubertus Muitjens

Robertus Johannes Marinus De Jongh

Christiaan Louis Valentin

Judocus Marie Dominicus Stoeldraijer

Jan Van Schoot

Rob Jansen

Nicolaas Antonius Allegondus Johannes Van Asten

Luberthus Ouwehand

Leon Joseph Marie Van Den Schoor

Elke Van Loenhout

Freerk Adriaan Stoffels

Aleksey Yurievich Kolensnychenko

Manfred Helmut Gustav Wilhelm Johannes Schrenk

Peter Weissbrodt

Roelof Aeilko Siebranc Ritsema

Antonius Van Dijsseldonk

Roelof Aeiko Siebrand Ritsema

Sjoerd Nicolaas Lamburtus Donders

A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5&#xd7; and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.

Lithographic method and apparatus

Growing community of inventors

's-Hertogenbosch, Netherlands

Timotheus Franciscus Sengers