Braun Gmbh

Timo Hasenpflug

Michael Kloeppel-Riech

Katja Honnefeller

Juergen Seng, Sr

Olaf Soerensen

Jürgen Seng

Norbert Smetana

Olaf Sörensen

Michael Klöppel-Riech

The present invention relates to a hair care device (), having a handle (), a application head () which can be connected to the handle () and has a hair treatment device (), particularly a bristle and/or a tooth field, and having an ion discharging device () with at least one ion outlet () for discharging ions onto the hair. According to the invention, the hair care device () is characterized in that the application head () and/or a part of the housing surrounding the ion outlet () has at least one grounding surface for dissipating/limiting electrical charges. Advantageously, the ions are discharged exclusively from the back () of the device facing away from the hair treatment device (), while the grounding surface can be provided on the application head () on the front side of the device.

Hair care device with function head

The present invention relates to a hair care device () with a handle (), an operational head connected to the handle () having a hair treatment apparatus (), in particular a bristle field and/or a comb tooth field, and an ion-producing apparatus () for producing ions on the hair, having at least one ion outlet (). According to the invention, the hair care device () is characterized in that said hair care device has the feature of a back side () facing away from the hair treatment apparatus () and an ion-producing apparatus () for producing ions on the hair which has at least one switching unit, an ion source, an ion outlet () and a sheath surrounding the ion outlet (). Said hair care device () has in addition a grounding surface for the removal/limiting of electronic loads, which is arranged on a part of the housing in the area of the ion outlet, wherein the ion source has a potential level of &#x2212;10 to &#x2212;3 KV relative to the potential level of the grounding surface, the sheath has a potential level of &#x2212;2.5 to &#x2212;1 KV or of 20% to 50% of the potential level of the ion source relative to the potential level of the grounding surface, and the back side () of the device has a potential level of &#x2212;500 to &#x2212;100V or from 2% to 10% of the potential level of the ion source relative to the potential level of the grounding surface.

Hair care device with optimized ion release

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Frankfurt am Main, Germany

Timo Hasenpflug