Asml Netherlands B.v.

Femtolasers Produktions Gmbh

Tim Rathje

Johan Franciscus Maria Beckers

Arend Johannes Donkerbroek

Nirupam Banerjee

Daniel Grimm

Sandro Wricke

Gerhard Georg Paulus

Max Möller

Dominik Hoff

Peter Brakhage

Martin Tilke

Arthur Maxwell Sayler

An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

Image sensor for immersion lithography

The aim of the present disclosure is to enable a fast CE phase evaluation of the laser pulses, in particular in real time, including for multi-cycle pulses. Said aim is achieved by providing a polarization gating stage () for changing the laser pulses () to be evaluated in the phase and subsequent phase evaluation stage () for measuring the phase position of the changed laser pulses. The descriptions in the present disclosure can be used for example in laser technology for producing and monitoring single-cycle pulses.

Method and device for the fast phase evaluation, in particular of multi-cycle pulses of laser radiation

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Jena, Germany

Tim Rathje