Gebr. Schmidt Fabrik Fur Feinmechanik, Gmbh & Co. Kg

Febit Biotech Gmbh

Tilo Strobelt

Cord F Staehler

Martin Mueller

Peter Nommensen

Michael Sesterhenn

Joerg Mellmann

Guenther Waibel

Johannes Frech

In the case of a method for producing a fluid device with a fluid structure having an active height, a basic wafer is provided, which comprises a supporting substrate, an insulating layer on the supporting substrate and a patterned layer on the supporting substrate, the thickness of the patterned layer determining the active height of the fluid structure. Following this, the fluid structure is produced in the patterned layer of the basic wafer, said fluid structure extending through the semiconductor layer. A transparent wafer is then applied so that the fluid structure is covered. Subsequently, the supporting substrate and the insulating layer are removed from the back so that the fluid structure is exposed at a second surface of the patterned layer. Finally, a second transparent wafer is attached to the exposed second surface of the semiconductor layer so that the fluid structure is covered. The essential parameter of the fluid device, viz. the active height of the fluid structure, need no longer be controlled making use of the etching parameters, but is already determined by the specifications of the starting material, e.g. an SOI wafer. This means that economy-priced fluid devices can be produced with high precision.

Method for producing a fluid device, fluid device and analysis apparatus

A dosing device for demand-dosing a liquid includes a primary container, a point of release for releasing the liquid, a main liquid channel between the primary container and the point of release and a vented secondary container, wherein the secondary container is coupled to the main liquid channel at a branch point, wherein the secondary container and the main liquid channel are designed such that the main liquid channel preferably fills with the liquid before the secondary container. The dosing device further includes a liquid valve between the primary container and the branch point, a sensor for measuring the filling level in the secondary container and finally means for opening the valve responsive to a predetermined filling level in the secondary container. By measuring the flow not directly in the main stream but via a filling level of a secondary container in an auxiliary stream, the secondary container can be designed independently of ambient temperature and ambient pressure so that cases of failure due to changing ambient conditions do no longer occur. A preferred application of the dosing system is the use of it in an electronic writing apparatus.

Dosing device and writing implement with a dosing device

Growing community of inventors

Villingen-Schwenningen, Germany

Tilo Strobelt